Abstract: A system includes a survey device and at least one processor. The survey device includes a support and a sensor attached to the support. The sensor is configured to capture measurement data. The at least one processor is coupled to the sensor to receive the measurement data. The at least one processor is configured to obtain a scene model corresponding to an initial set of the measurement data captured by the sensor when the support is located at an initial position, determine a location of the survey device relative to the scene model based on the initial set of the measurement data and the scene model, and update the location of the survey device relative to the scene model, based on subsequent sets of the measurement data captured by the sensor when the support is located at corresponding subsequent positions.

Abstract: A system includes a measurement device having an electronic distance measurement (EDM) instrument, and at least one processor coupled to the EDM instrument. The at least one processor is configured to localize the measurement device relative to a design model, the measurement device being physically located at a measurement location, automatically generate, for at least one design element in the design model, a plurality of sample directions, control the EDM instrument to automatically perform measurements in the plurality of sample directions, and generate and output a verification result indicating a relation between the at least one design element and at least one object corresponding to the at least one design element, based on a shape of the at least one design element and measurement data of the measurements.