Abstract: A tunable laser assembly housed in a single enclosure and a method of control is described wherein the tunable laser, pump and semiconductor optical amplifier do not share a common optical axis but are all aligned to optical waveguides on an intervening planar lightwave circuit (PLC). Wavelength monitoring circuitry is included on the PLC to enable monitoring and control of the tunable laser center wavelength and optical bandwidth. The design of the PLC does not introduce perturbations into the swept-source laser output spectrum that would cause artifacts in imaging applications such as optical coherence tomography (OCT).

Abstract: A tunable laser assembly housed in a single enclosure and a method of control is described wherein the tunable laser, pump and semiconductor optical amplifier do not share a common optical axis but are all aligned to optical waveguides on an intervening planar lightwave circuit (PLC). Wavelength monitoring circuitry is included on the PLC to enable monitoring and control of the tunable laser center wavelength and optical bandwidth. The design of the PLC does not introduce perturbations into the swept-source laser output spectrum that would cause artifacts in imaging applications such as optical coherence tomography (OCT).

Abstract: A tunable laser assembly housed in a single enclosure and a method of control is described wherein the tunable laser, pump and semiconductor optical amplifier do not share a common optical axis but are all aligned to optical waveguides on an intervening planar lightwave circuit (PLC). Wavelength monitoring circuitry is included on the PLC to enable monitoring and control of the tunable laser center wavelength and optical bandwidth. The design of the PLC does not introduce perturbations into the swept-source laser output spectrum that would cause artifacts in imaging applications such as optical coherence tomography (OCT).

Abstract: A tunable laser assembly housed in a single enclosure and a method of control is described wherein the tunable laser, pump and semiconductor optical amplifier do not share a common optical axis but are all aligned to optical waveguides on an intervening planar lightwave circuit (PLC). Wavelength monitoring circuitry is included on the PLC to enable monitoring and control of the tunable laser center wavelength and optical bandwidth. The design of the PLC does not introduce perturbations into the swept-source laser output spectrum that would cause artifacts in imaging applications such as optical coherence tomography (OCT).

Abstract: The present invention relates to a waveguide structure, and methods for making the same. The waveguide structure has a polarization rotator for rotating the polarization of the electromagnetic signal, preferably by about ninety-degrees. In one embodiment, the polarization rotator has a midsection with a first level and a second level. The first level of the midsection has a width that decreases along the length of the first level, while the second level has a substantially constant width along the length of the second level. Further, the waveguide structure can include an input conditioning section and the output conditioning section to facilitate matching between the polarization rotator and other waveguide elements.

Abstract: A plurality of mask images defines an optical circuit image in photoresist. Each of the mask images comprises parts of the optical circuit and the totality of all mask images together defines an optical circuit. The optical circuit is thus made up of plural optical elements some of which may be positioned in drop-in locations within the boundary of another optical circuit element. A photolithography system globally aligns and exposes the mask images in photoresist. The resultant composite image is substantially indistinguishable from a single image of the entire optical circuit. Different images for each of the mask image parts can be substituted with other images or image parts and thereby exponentially increasing the number of circuit permutations from a predetermined number of available mask images. A unique optical circuit, for example, can be generated from a pre-existing library of reticle images. The images are printed in predetermined locations on a substrate to define the desired optical circuit.

Abstract: A method for forming an optical circuit on a substrate. The method comprising a plurality of mask images to define the optical circuit image in photoresist. Each of the mask images defining parts of the optical circuit and the totality of all mask images substantially defining all of the optical circuit. A photolithography system globally aligns and exposes the mask images in photoresist. The resultant composite image being substantially indistinguishable from a single image of the entire optical circuit. Different images for each of the parts can be substituted by other images, thereby exponentially increasing the number of circuit permutations from a predetermined number of images. The method is also applicable to generating a unique circuit from a pre-existing library of reticle images. The images are printed in predetermined locations on a substrate to define the desired optical circuit.

Abstract: A manufacturing process is provided for fabrication of vertically coupled integrated photonic devices by projection lithographic technique. A multi-layered structure is formed which includes a pair of core waveguiding layers separated by a coupling interlayer and sandwiched between cladding layers. Prior to forming optical features in the core layers, alignment marks are etched completely through the whole multi-layered structure with the alignment marks being visible on both sides of the multi-layered structure to a conventional projection stepper. After the alignment marks are formed, a “bottom level” optical features are made through the bottom cladding layer, bottom core layer, and portion of intervening coupling layer. The formed sample is then bonded by a polymer to a carrier and a “top level” optical features are defined through the top cladding, top core layer, and portion of the intervening coupling layer.

Abstract: A manufacturing process is provided for fabrication of vertically coupled integrated photonic devices by projection lithographic technique. A multi-layered structure is formed which includes a pair of core waveguiding layers separated by a coupling interlayer and sandwiched between cladding layers. Prior to forming optical features in the core layers, alignment marks are etched completely through the whole multi-layered structure with the alignment marks being visible on both sides of the multi-layered structure to a conventional projection stepper. After the alignment marks are formed, a “bottom level” optical features are made through the bottom cladding layer, bottom core layer, and portion of intervening coupling layer. The formed sample is then bonded by a polymer to a carrier and a “top level” optical features are defined through the top cladding, top core layer, and portion of the intervening coupling layer.

Abstract: An active monolithic optical device for wavelength division multiplexing (WDM) incorporating diode laser arrays, an output coupling waveguide and a curved Rowland circle based grating to produce a plurality of individual laser beams at slightly different wavelengths is integrated in a common electro-optic material. The wavelength of each laser source is determined by the geometry of the array and the diffraction grating design. The output of all the channels can be collected into a concentrator or lens to be multiplexed in a single output. Applications include a WDM optical amplifier and WDM laser source.