Patents by Inventor John J. Mazzocco
John J. Mazzocco has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11211230Abstract: A gas flow system is provided, including a gas flow source, one or more gas inlets, one or more gas outlets, a gas flow region, a low pressure region, wherein the low pressure region is fluidly coupled to the one or more gas outlets, a high pressure region, and a gap. The one or more gas inlets are fluidly coupleable to the gas flow source. The gas flow region is fluidly coupled to the one or more gas inlets and the one or more gas outlets. The gap fluidly couples the gas flow region to the high pressure region. The high pressure region near the targets allows for process gas interactions with the target to sputter onto the substrate below. The low pressure region near the substrate prevents unwanted chemical interactions between the process gas and the substrate.Type: GrantFiled: April 2, 2020Date of Patent: December 28, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Keith A. Miller, Wei W. Wang, Alexander Erenstein, John J. Mazzocco
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Patent number: 11087998Abstract: A transfer chamber configured to be used during semiconductor device manufacturing is described. Transfer chamber includes at least one first side of a first width configured to couple to one or more substrate transfer units (e.g., one or more load locks or one or more pass-through units), and at least a second set of sides of a second width that is different than the first width, the second set of sides configured to couple to one or more processing chambers. A total number of sides of the transfer chamber is at least seven. Transfers within the transfer chamber are serviceable by a single robot. Process tools and methods for processing substrates are described, as are numerous other aspects.Type: GrantFiled: March 20, 2019Date of Patent: August 10, 2021Assignee: Applied Materials, Inc.Inventors: Michael Robert Rice, Michael Meyers, John J. Mazzocco, Dean C. Hruzek, Michael Kuchar, Sushant S. Koshti, Penchala N. Kankanala, Eric A. Englhardt
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Patent number: 11018036Abstract: Methods, apparatus, and assemblies are provided for a substrate carrier adapter insert including an adapter frame including a support rail adapted to support one or more substrates in a substrate carrier, a frame extension coupled to, or integral with, the adapter frame, and a mapping feature formed on the frame extension and disposed to be detected by a sensor for determining whether an adapter insert is present or absent in a substrate carrier. Numerous additional features are disclosed.Type: GrantFiled: August 13, 2018Date of Patent: May 25, 2021Assignee: Applied Materials, Inc.Inventors: John J. Mazzocco, Edward Ng, Douglas MacLeod, David Phillips, Ayan Majumdar, Jeffrey C. Hudgens
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Publication number: 20210143034Abstract: A substrate processing system includes a factory interface, a transfer chamber, and a robot. The transfer chamber includes four first facets adapted for attachment to one or more first processing chambers and three second facets, wherein each of the three second facets has a width that is narrower than that of each of the four first facets. The system includes a second processing chamber having a first interface attached to a first of the three second facets and a load lock attached to a second of the three second facets and to the factory interface. The system also includes a robot attached to a bottom of the transfer chamber, the robot adapted to transfer substrates to and from the one or more first processing chambers, the second processing chamber, and the load lock.Type: ApplicationFiled: January 22, 2021Publication date: May 13, 2021Inventors: Michael Robert Rice, Michael Meyers, John J. Mazzocco, Dean C. Hruzek, Michael Kuchar, Sushant S. Koshti, Penchala N. Kankanala, Eric A. Englhardt
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Patent number: 10971381Abstract: A transfer chamber configured to be used during semiconductor device manufacturing is described. Transfer chamber includes at least one first side of a first width configured to couple to one or more substrate transfer units (e.g., one or more load locks or one or more pass-through units), and at least a second set of sides of a second width that is different than the first width, the second set of sides configured to couple to one or more processing chambers. A total number of sides of the transfer chamber is at least seven. Transfers within the transfer chamber are serviceable by a single robot. Process tools and methods for processing substrates are described, as are numerous other aspects.Type: GrantFiled: November 3, 2014Date of Patent: April 6, 2021Assignee: Applied Materials, Inc.Inventors: Michael Robert Rice, Michael Meyers, John J. Mazzocco, Dean C. Hruzek, Michael Kuchar, Sushant S. Koshti, Penchala N. Kankanala, Eric A. Englhardt
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Publication number: 20200335310Abstract: A gas flow system is provided, including a gas flow source, one or more gas inlets, one or more gas outlets, a gas flow region, a low pressure region, wherein the low pressure region is fluidly coupled to the one or more gas outlets, a high pressure region, and a gap. The one or more gas inlets are fluidly coupleable to the gas flow source. The gas flow region is fluidly coupled to the one or more gas inlets and the one or more gas outlets. The gap fluidly couples the gas flow region to the high pressure region. The high pressure region near the targets allows for process gas interactions with the target to sputter onto the substrate below. The low pressure region near the substrate prevents unwanted chemical interactions between the process gas and the substrate.Type: ApplicationFiled: April 2, 2020Publication date: October 22, 2020Inventors: Keith A. MILLER, Wei W. WANG, Alexander ERENSTEIN, John J. MAZZOCCO
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Publication number: 20200312683Abstract: A moveable substrate support for use in a processing chamber is provided. The moveable substrate support includes a substrate support surface and a robot, wherein the robot is configured to move the substrate support surface along a movement path. The substrate support includes a halo, and the halo protects the underlying components of the processing chamber from unwanted deposition, while the substrate support surface is moving along the movement path. The substrate support protects processing chamber components from deposition, reducing cleaning time and reducing the need for repairs of the components of the processing chamber.Type: ApplicationFiled: March 3, 2020Publication date: October 1, 2020Inventors: Ilya LAVITSKY, Keith A. MILLER, John J. MAZZOCCO, Wei W. WANG
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Publication number: 20190214284Abstract: A transfer chamber configured to be used during semiconductor device manufacturing is described. Transfer chamber includes at least one first side of a first width configured to couple to one or more substrate transfer units (e.g., one or more load locks or one or more pass-through units), and at least a second set of sides of a second width that is different than the first width, the second set of sides configured to couple to one or more processing chambers. A total number of sides of the transfer chamber is at least seven. Transfers within the transfer chamber are serviceable by a single robot. Process tools and methods for processing substrates are described, as are numerous other aspects.Type: ApplicationFiled: March 20, 2019Publication date: July 11, 2019Inventors: Michael Robert Rice, Michael Meyers, John J. Mazzocco, Dean C. Hruzek, Michael Kuchar, Sushant S. Koshti, Penchala N. Kankanala, Eric A. Englhardt
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Patent number: 10196845Abstract: A substrate carrier door assembly including relatively high sealing force that can be modulated. Substrate carrier door assembly includes a carrier door configured to seal to a carrier body, a first attraction member on the carrier body, and a second attraction member on the carrier door. Attraction members are selected from a group of a magnetic material and a permanent magnet. Substrate carrier door assembly includes a magnetic field generator energizable to reduce attraction force between the attraction members making the carrier door relatively easier to remove, yet providing enhanced sealing when not energized. Substrate carriers including the substrate carrier door assembly and methods of processing substrates are provided. A substrate carrier including a port configured to allow gas to be injected into, or removed from, a carrier chamber, and a magnetic port seal is also disclosed, as are numerous other aspects.Type: GrantFiled: April 15, 2016Date of Patent: February 5, 2019Assignee: Applied Materials, Inc.Inventors: John J. Mazzocco, Nir Merry
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Publication number: 20180350637Abstract: Methods, apparatus, and assemblies are provided for a substrate carrier adapter insert including an adapter frame including a support rail adapted to support one or more substrates in a substrate carrier, a frame extension coupled to, or integral with, the adapter frame, and a mapping feature formed on the frame extension and disposed to be detected by a sensor for determining whether an adapter insert is present or absent in a substrate carrier. Numerous additional features are disclosed.Type: ApplicationFiled: August 13, 2018Publication date: December 6, 2018Inventors: John J. Mazzocco, Edward Ng, Douglas MacLeod, David Phillips, Ayan Majumdar, Jeffrey C. Hudgens
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Patent number: 10115616Abstract: Methods, apparatus, and assemblies are provided for an adapter insert including an adapter frame including a support rail adapted to support one or more substrates in a substrate carrier, a frame extension coupled to, or integral with, the adapter frame, and a mapping feature formed on the frame extension and disposed to be detected by a sensor for determining whether an adapter insert is present or absent in a substrate carrier. Numerous additional features are disclosed.Type: GrantFiled: July 16, 2014Date of Patent: October 30, 2018Assignee: Applied Materials, Inc.Inventors: John J. Mazzocco, Edward Ng, Douglas MacLeod, David Phillips, Ayan Majumdar, Jeffrey C. Hudgens
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Patent number: 10023954Abstract: Slit valve apparatuses are described. In one aspect, a slit valve apparatus is disclosed having a gate with at least one sealing surface, a blocker element, and a connector member that structurally connects the gate and the blocker element. Systems and methods including the slit valve apparatus are also disclosed, as are numerous other aspects.Type: GrantFiled: September 10, 2012Date of Patent: July 17, 2018Assignee: Applied Materials, Inc.Inventors: John J. Mazzocco, Dale Robert Du Bois, Juan Carlos Rocha-Alvarez
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Publication number: 20160340947Abstract: A substrate carrier door assembly including relatively high sealing force that can be modulated. Substrate carrier door assembly includes a carrier door configured to seal to a carrier body, a first attraction member on the carrier body, and a second attraction member on the carrier door. Attraction members are selected from a group of a magnetic material and a permanent magnet. Substrate carrier door assembly includes a magnetic field generator energizable to reduce attraction force between the attraction members making the carrier door relatively easier to remove, yet providing enhanced sealing when not energized. Substrate carriers including the substrate carrier door assembly and methods of processing substrates are provided. A substrate carrier including a port configured to allow gas to be injected into, or removed from, a carrier chamber, and a magnetic port seal is also disclosed, as are numerous other aspects.Type: ApplicationFiled: April 15, 2016Publication date: November 24, 2016Inventors: John J. Mazzocco, Nir Merry
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Publication number: 20160225646Abstract: A transfer chamber configured to be used during semiconductor device manufacturing is described. Transfer chamber includes at least one first side of a first width configured to couple to one or more substrate transfer units (e.g., one or more load locks or one or more pass-through units), and at least a second set of sides of a second width that is different than the first width, the second set of sides configured to couple to one or more processing chambers. A total number of sides of the transfer chamber is at least seven. Transfers within the transfer chamber are serviceable by a single robot. Process tools and methods for processing substrates are described, as are numerous other aspects.Type: ApplicationFiled: November 3, 2014Publication date: August 4, 2016Inventors: Michael Robert RICE, Michael MEYERS, John J. MAZZOCCO, Dean C. HRUZEK, Michael KUCHAR, Sushant S. KOSHTI, Penchala N. KANKANALA, Eric A. ENGLHARDT
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Publication number: 20150022821Abstract: Methods, apparatus, and assemblies are provided for an adapter insert including an adapter frame including a support rail adapted to support one or more substrates in a substrate carrier, a frame extension coupled to, or integral with, the adapter frame, and a mapping feature formed on the frame extension and disposed to be detected by a sensor for determining whether an adapter insert is present or absent in a substrate carrier. Numerous additional features are disclosed.Type: ApplicationFiled: July 16, 2014Publication date: January 22, 2015Inventors: John J. Mazzocco, Edward Ng, Douglas MacLeod, David Phillips, Ayan Majumdar, Jeffrey C. Hudgens
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Publication number: 20130068391Abstract: Slit valve apparatuses are described. In one aspect, a slit valve apparatus is disclosed having a gate with at least one sealing surface, a blocker element, and a connector member that structurally connects the gate and the blocker element. Systems and methods including the slit valve apparatus are also disclosed, as are numerous other aspects.Type: ApplicationFiled: September 10, 2012Publication date: March 21, 2013Applicant: APPLIED MATERIALS, INC.Inventors: John J. Mazzocco, Dale Robert Du Bois, Juan Carlos Rocha-Alvarez