Patents by Inventor John James Hoglen

John James Hoglen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reduced by product polyamine-epihalohydrin resins
    Patent number: 7175740
    Abstract: Processes for rendering a polyamine-epihalohydrin resin storage stable, including processes that prepare a storage stable resin and/or processes that treat resins. A composition containing a polyamine-epihalohydrin resin which includes CPD-forming species can be treated with at least one agent under conditions to at least one of inhibit, reduce and remove the CPD-forming species to obtain a reduced CPD-forming resin so that a composition containing the reduced CPD-forming polyamine-epihalohydrin resin when stored for 2 weeks at 50° C., and a pH of about 2.5 to 3.5 contains less than about 250 ppm dry basis of CPD. The invention is also directed to a gelation storage stable reduced CPD-forming resin so that a composition containing the reduced CPD-forming polyamine-epihalohydrin resin, when stored at pH 1 for 24 hours at 50° C. and measured at 24 hours, produces less than about 1000 ppm dry basis of CPD.
    Type: Grant
    Filed: March 25, 2003
    Date of Patent: February 13, 2007
    Assignee: Hercules Incorporated
    Inventors: Richard James Riehle, Anthony J. Allen, Michaela Hofbauer, Alfred Jacques Haandrikman, Ronald Busink, Mark T. Crisp, John James Hoglen, Huai Nan Cheng, Francis J. Carlin, Jr., John Arthur Lapre, Harold Jabloner
  • Reduced by product polyamine-epihalohydrin resins
    Publication number: 20030205345
    Abstract: Processes for rendering a polyamine-epihalohydrin resin storage stable, including processes that prepare a storage stable resin and/or processes that treat resins. A composition containing a polyamine-epihalohydrin resin which includes CPD-forming species can be treated with at least one agent under conditions to at least one of inhibit, reduce and remove the CPD-forming species to obtain a reduced CPD-forming resin so that a composition containing the reduced CPD-forming polyamine-epihalohydrin resin when stored for 2 weeks at 50° C., and a pH of about 2.5 to 3.5 contains less than about 250 ppm dry basis of CPD. The invention is also directed to a gelation storage stable reduced CPD-forming resin so that a composition containing the reduced CPD-forming polyamine-epihalohydrin resin, when stored at pH 1 for 24 hours at 50° C. and measured at 24 hours, produces less than about 1000 ppm dry basis of CPD.
    Type: Application
    Filed: March 25, 2003
    Publication date: November 6, 2003
    Inventors: Richard James Riehle, Anthony J. Allen, Michaela Hofbauer, Alfred Jacques Haandrikman, Ronald Busink, Mark T. Crisp, John James Hoglen, Huai Nan Cheng, Francis J. Carlin, John Arthur Lapre, Harold Jabloner
  • Reduced byproduct polyamine-epihalohydrin resins
    Patent number: 6554961
    Abstract: Processes for rendering a polyamine-epihalohydrin resin storage stable, including processes that prepare a storage stable resin and/or processes that treat resins. A composition containing a polyamine-epihalohydrin resin which includes CPD-forming species can be treated with at least one agent under conditions to at least one of inhibit, reduce and remove the CPD-forming species to obtain a reduced CPD-forming resin so that a composition containing the reduced CPD-forming polyamine-epihalohydrin resin when stored for 2 weeks at 50° C., and a pH of about 2.5 to 3.5 contains less than about 250 ppm dry basis of CPD. The invention is also directed to a gelation storage stable reduced CPD-forming resin so that a composition containing the reduced CPD-forming polyamine-epihalohydrin resin, when stored at pH 1 for 24 hours at 50° C. and measured at 24 hours, produces less than about 1000 ppm dry basis of CPD.
    Type: Grant
    Filed: June 12, 2000
    Date of Patent: April 29, 2003
    Assignee: Hercules Incorporated
    Inventors: Richard James Riehle, Anthony J. Allen, Michaela Hofbauer, Alfred Jacques Haandrikman, Ronald Busink, Mark T. Crisp, John James Hoglen, Huai Nan Cheng, Francis J. Carlin, Jr., John Arthur Lapre, Harold Jabloner