Patents by Inventor John Joseph Biafore

John Joseph Biafore has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7217497
    Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
    Type: Grant
    Filed: June 8, 2004
    Date of Patent: May 15, 2007
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
  • Patent number: 6924339
    Abstract: Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula: wherein R1 is H or methyl; R2 is a substituted or unsubstituted C6-C14 aryl acrylate or C6-C14 aryl methacrylate group wherein the substituted groups may be phenyl, C1-4 alkyl or C1-4 alkoxy; R3 is a hydroxyl functionalized C1-C8 alkyl acrylate, methacrylate or C6-C14 aryl group, R4 is a C1-C10 linear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [—R4O—]p; R5 is a C1-C10 linear, branched or cyclic alkyl, substituted or unsubstituted C6-C14 aryl, or substituted or unsubstituted C7-C15 alicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.
    Type: Grant
    Filed: May 14, 2003
    Date of Patent: August 2, 2005
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Binod B. De, Sanjay Malik, Gregory Spaziano, John Joseph Biafore, Patrick Foster, Sidney George Slater, Thomas Steinhausler, Andrew J. Blakeney
  • Publication number: 20040219454
    Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
    Type: Application
    Filed: June 8, 2004
    Publication date: November 4, 2004
    Applicant: ARCH SPECIALTY CHEMICALS, INC.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhausler, Andrew J. Blakeney, John Joseph Biafore
  • Patent number: 6783916
    Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
    Type: Grant
    Filed: July 9, 2001
    Date of Patent: August 31, 2004
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
  • Publication number: 20030204035
    Abstract: Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula: 1
    Type: Application
    Filed: May 14, 2003
    Publication date: October 30, 2003
    Applicant: Arch Specialty Chemicals Inc.
    Inventors: Binod B. De, Sanjay Malik, Gregory Spaziano, John Joseph Biafore, Patrick Foster, Sidney George Slater, Thomas Steinhausler, Andrew J. Blakeney
  • Patent number: 6610808
    Abstract: Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula: wherein R1 is H or methyl; R2 is a substituted or unsubstituted C6-C14 aryl acrylate or C6-C14 aryl methacrylate group wherein the substituted groups may be phenyl, C1-4 alkyl or C1-4 alkoxy; R3 is a hydroxyl functionalized C1-C8 alkyl acrylate, methacrylate or C6-C14 aryl group, R4 is a C1-C10 linear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [—R4O—]p; R5 is a C1-C10 linear, branched or cyclic alkyl, substituted or unsubstituted C6-C14 aryl, or substituted or unsubstituted C7-C15 alicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.
    Type: Grant
    Filed: March 7, 2002
    Date of Patent: August 26, 2003
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Binod B. De, Sanjay Malik, Gregory Spaziano, John Joseph Biafore, Patrick Foster, Sidney George Slater, Thomas Steinhausler, Andrew J. Blakeney
  • Patent number: 6492092
    Abstract: The present invention is directed to a thermally curable polymer composition comprising a hydroxyl-containing polymer and a polyfunctional epoxide as a crosslinking agent. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography. In addition, the present invention also relates to a photolithographic coated substrate comprising: a substrate, the thermally cured undercoat composition on the substrate, and a radiation-sensitive resist topcoat on the thermally cured undercoat composition. Furthermore, the present invention further relates to a process for using the photolithographic coated substrate for the production of relief structures.
    Type: Grant
    Filed: March 12, 1999
    Date of Patent: December 10, 2002
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
  • Publication number: 20020173594
    Abstract: Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the following formula: 1
    Type: Application
    Filed: March 7, 2002
    Publication date: November 21, 2002
    Applicant: ARCH SPECIALTY CHEMICALS, INC.
    Inventors: Binod B. De, Sanjay Malik, Gregory Spaziano, John Joseph Biafore, Patrick Foster, Sidney George Slater, Thomas Steinhausler, Andrew J. Blakeney
  • Publication number: 20020007018
    Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
    Type: Application
    Filed: July 9, 2001
    Publication date: January 17, 2002
    Applicant: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhausler, Andrew J. Blakeney, John Joseph Biafore
  • Patent number: 6323287
    Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
    Type: Grant
    Filed: March 12, 1999
    Date of Patent: November 27, 2001
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
  • Patent number: 6165682
    Abstract: Radiation sensitive resins for use in a top layer resists in bilayer systems for use in deep UV photolithography comprises copolymers having the following structural units: ##STR1## and optionally, ##STR2## wherein n is an integer of 1 to 5, R.sup.1 is methyl or trimethylsiloxy, R.sup.2 is a tert-butyl group, R.sup.3, R.sup.4 and R.sup.5 are each independently hydrogen or a methyl group.
    Type: Grant
    Filed: September 22, 1999
    Date of Patent: December 26, 2000
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, John Joseph Biafore, Gregory Domenic Spaziano
  • Patent number: 6054248
    Abstract: The present invention is directed to a thermally curable polymer composition comprising a hydroxyl-containing polymer and a polyfunctional isocyanate as a crosslinking agent, which is particularly useful in photolithographic coating of substrates. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography. Furthermore, the present invention further relates to a process for using the photolithographic coated substrate for the production of relief structures.
    Type: Grant
    Filed: March 12, 1999
    Date of Patent: April 25, 2000
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhausler, Andrew J. Blakeney, John Joseph Biafore