Abstract: A process for fabricating volatile and nonvolatile field effect devices on a common semiconductor wafer, and a unique composite structure for a nonvolatile memory device fabricated according to the process. A distinct feature of the process is the elimination of nitride from beneath any poly I layers while selectively retaining sandwiched and coextensive segments of nitride and poly II layers for the memory devices. In one form, the method commences with a wafer treated according to the general localized oxidation of silicon process, followed by a blanket enhancement implant and selectively masked depletion implants. The succeeding contact etch step is followed by a deposition of a poly I layer, a resistor forming implant and a patterned etch of the poly I layer. Thereafter, a first isolation oxide is grown, selective implants are performed to center the memory window, the memory area is etched, and the memory area is covered by a regrowth of a very thin memory oxide.

Abstract: An improved technique for correcting errors in track, for example errors in alignment and cross-level. A record of the actual geometric condition of a section of track is obtained by running a recording car operating at a predetermined speed and axle loading over the track. A record which may be on magnetic tape is thus obtained for one or more parameters such as alignment. In some cases this record may be used directly to derive electrical error signals which control a track moving device which moves the track in a direction to remove the error. Where the parameter of interest is alignment and the section of track is curved, a desired geometric condition has to be obtained for comparison with the actual geometric condition to derive the electrical error signals. One way of obtaining the desired geometric condition is to process the record to achieve a running average taken over ten or so consecutive sample points.

Abstract: A method of conditioning a nitride surface by treating it with ionized oxygen is disclosed. The nitride surface is placed in a vacuum and treated with the ionized oxygen for a period of time sufficient to condition the nitride for subsequent processing steps. The ionized oxygen treatment is performed substantially at ambient temperature. The conditioning method is included in a process for improving the adhesion characteristics of a photoresist film to a silicon nitride surface. A liquid solution of hexamethyldisilazane is applied to the conditioned nitride surface. Thereafter, a photoresist is applied, exposed through a photographic mask and developed in a known manner for the purpose of forming a photoresist masking film pattern. The photoresist film pattern typically serves as a mask during an etching process in which areas not covered by photoresist are removed by a suitable etching solution.

Abstract: A system including method and apparatus for conveying and orientating tie plates for use with a railway track renewal or construction machine designed to run along a railway track. The system provides a delivery of tie plates to mechanisms for positioning and laying the plates on new or reconditioned ties adjacent both ends of each tie with the field side of the tie plate facing outwardly. A first longitudinally directed power driven conveyor is located centrally with its inlet end in a gondola car used to store the tie plates. This conveyor is divided along its longitudinal center by a wall to provide a means for conveying two adjacent lines of tie plates. The tie plates are introduced to this first conveyor on both sides of the dividing wall with the plates facing upward and the field end of the plates facing forward. A pair of second longitudinally directed power driven conveyors are located on the track working machine downstream of and outwardly from the first conveyor and at a lower level.

Abstract: A device for lifting and/or lining railroad track, which device extends longitudinally of the track and is mounted at one end on a truck carrying track engaging wheels, and the other end is adapted to be connected to a propelling vehicle. Reaction blocks are provided on the beam in the region of the other end, and a track position correcting frame is carried between the reaction blocks and the end mounted on the truck and close to the other beam end. The device provides a lifting and/or aligning attachment for, say a tamping machine, which attachment substantially absorbs all its own lifting and/or lining forces and transmits them to the track rather than to the tamping machine. The device also provides a track position reference means to provide information on the displacement of the lifted and/or aligned track.

Abstract: A railway ballast tamping tool is disclosed which has a foot welded to the lower end of a shank. The foot has rectangular front and rear faces and is gradually tapered from one side to the other.

Abstract: The invention provides for a stop device positioned on a railroad track shifting machine such as a track lifting and/or tamping machine and a sensor for generating a control signal to terminate or control the shifting action of the machine when the shifting force on the rail exceeds a predetermined value.

Abstract: The invention relates to a process and apparatus for correcting the surface of a railroad track by exerting pressure on the shoulders of the track from both sides thereof by means of vibrating compactors mounted on a vehicle chassis and provided with pressure applying jacks. The ballast is compacted beneath the track which raises it to a desired first track level which may be above the final desired track level, whereafter the track is tamped down to the desired level by means of a force applicator which imparts pulsating force to depress the raised track.

Abstract: An improvement of the prior art method of processing large scale integrated (LSI) semiconductors is disclosed, wherein an etching procedure, which was previously performed as the final processing step, is now done at an earlier stage to preclude damage to the surface of the wafer on which the active devices are formed. In the prior art method of fabricating an active device on a semiconductor wafer, an undesirable layer of field oxide manifests itself on the reverse side when the field oxide is grown on the obverse or principal side of the wafer. The prior processing philosophy was to allow the oxide layer to remain on the wafer until after the processing was completed and, as a final step, the undesired oxide coating was removed. This was done by carefully placing the wafer in a pool of etchant so that only the reverse side is etched.

Abstract: An indicator mechanism for an apparatus for correcting the existing grade and horizontal alignment of railroad track in accordance with a wire reference system. The mechanism includes frame means, the position of which in use is referenced to the existing position of an adjacent section of the railroad track. Pivot means are mounted on the frame means and a needle indicator is mounted on the pivot means so as to pivot about a horizontal axis generally parallel to a reference wire. A second indicator is mounted on the needle indicator for generally vertical, sliding movement thereon. A first index is arranged on the frame means to indicate in combination with the needle indicator the existing horizontal alignment of the adjacent section with reference to the reference wire. A second index in the form of a scale is arranged on the needle indicator and it indicates in combination with the second indicator the existing grade of the adjacent section of a track again with reference to the reference wire.