Patents by Inventor John K. Zeigler

John K. Zeigler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5039593
    Abstract: Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.
    Type: Grant
    Filed: March 31, 1989
    Date of Patent: August 13, 1991
    Inventor: John K. Zeigler