Patents by Inventor John Keem

John Keem has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8812976
    Abstract: A computer-implemented method, system, and computer readable medium for configuring programmable equipment having hardware devices that can be programmatically interconnected into different hardware configurations. A graphical user interface is provided on a computer display which permits a user to iconically define both a hardware and procedural configuration of the available hardware devices. Configuration data is generated that can be used to automatically configure the programmable equipment according to the user-defined hardware and procedural configuration.
    Type: Grant
    Filed: March 16, 2010
    Date of Patent: August 19, 2014
    Assignee: RHK Technology, Inc.
    Inventors: Adam Kollin, John Keem, Steffen Porthun
  • Patent number: 7718983
    Abstract: Shielding associated with an ion source, such as an anode layer source, reduces the amount and/or concentration of sputtered contaminants impinging and remaining on the surface of a target substrate. While passing the ion beam through to the target substrate, shielding can reduce the total amount of sputtered contaminants impinging the substrate before, during, and/or after passage of the substrate through the envelope of the etching beam. Particularly, a shield configuration that blocks the contaminants from impinging the substrate after the substrate passes through the etching beam (i.e., outside of the envelope of the etching beam) yields a higher quality substrate with reduced substrate contamination.
    Type: Grant
    Filed: August 16, 2004
    Date of Patent: May 18, 2010
    Assignee: Veeco Instruments, Inc.
    Inventors: David Matthew Burtner, Daniel E. Siegfried, Richard Blacker, Valery Alexeyev, John Keem, Vsevolod Zelenkov, Mark Krivoruchko
  • Patent number: 7195661
    Abstract: Magnetic materials having a coercivity not less than about 1000 Oersted are prepared in a single step procedure. A molten mixture of a desired composition having a relatively high boron content is cooled at a rate slower than about 105 degrees Celsius per second. Preferably, the molten mixture is cooled by depositing it on a chilled surface such that it forms a layer between about 120 and about 300, and preferably between about 120 and about 150, microns thick.
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: March 27, 2007
    Assignee: Pioneer Metals and Technology, Inc.
    Inventor: John Keem
  • Patent number: 6984942
    Abstract: An ion source design and manufacturing techniques allows longitudinal cathode expansion along the length of the anode layer source (ALS). Cathode covers are used to secure the cathode plates to the source body assembly of an ion source. The cathode covers allow the cathode plate to expand along the longitudinal axis of the ion source, thereby relieving the stress introduced by differential thermal expansion. In addition, the cathode cover configuration allows for less expensive cathode plates, including modular cathode plates. Such plates can be adjusted relative to the cathode-cathode gap to prolong the life of a given cathode plate and maintain source performance requirements. A cathode plate in a linear section of an ion source has symmetrical edges and can, therefore, be flipped over to exchange the first (worn) cathode edge with the second (unworn) cathode edge.
    Type: Grant
    Filed: July 21, 2004
    Date of Patent: January 10, 2006
    Assignee: Veeco Instruments, Inc.
    Inventors: Daniel E. Siegfried, David Matthew Burtner, Scott A. Townsend, John Keem, Valery Alexeyev, Vsevolod Zelenkov, Mark Krivoruchko
  • Patent number: 6919690
    Abstract: A modular ion source design relies on relatively short modular anode layer source (ALS) components, which can be coupled together to form a longer ALS. For long ion sources, these shorter modular components allow for easier manufacturing and further result in a final assembly having better precision (e.g., a uniform gap dimensions along the longitudinal axis of the ion source). Modular components may be designed to have common characteristics so as to allow use of these components in ion sources of varying sizes. A modular gas distribution system uniformly distributes a working gas to the ionization region of the module ion source. For each gas distribution module, gas distribution channels and baffles are laid out relative to the module joints to prevent gas leakage. Furthermore, gas manifolds and supply channels are used to bridge module joints while uniformly distributing the working gas to the ALS.
    Type: Grant
    Filed: July 21, 2004
    Date of Patent: July 19, 2005
    Assignee: Veeco Instruments, Inc.
    Inventors: Daniel E. Siegfried, David Matthew Burtner, Scott A. Townsend, John Keem, Mark Krivoruchko, Valery Alexeyev, Vsevolod Zelenkov
  • Publication number: 20050057166
    Abstract: An ion source design and manufacturing techniques allows longitudinal cathode expansion along the length of the anode layer source (ALS). Cathode covers are used to secure the cathode plates to the source body assembly of an ion source. The cathode covers allow the cathode plate to expand along the longitudinal axis of the ion source, thereby relieving the stress introduced by differential thermal expansion. In addition, the cathode cover configuration allows for less expensive cathode plates, including modular cathode plates. Such plates can be adjusted relative to the cathode-cathode gap to prolong the life of a given cathode plate and maintain source performance requirements. A cathode plate in a linear section of an ion source has symmetrical edges and can, therefore, be flipped over to exchange the first (worn) cathode edge with the second (unworn) cathode edge.
    Type: Application
    Filed: July 21, 2004
    Publication date: March 17, 2005
    Inventors: Daniel Siegfried, David Burtner, Scott Townsend, John Keem, Valery Alexeyev, Vsevolod Zelenkov, Mark Krivoruchko
  • Publication number: 20050045035
    Abstract: A modular ion source design relies on relatively short modular anode layer source (ALS) components, which can be coupled together to form a longer ALS. For long ion sources, these shorter modular components allow for easier manufacturing and further result in a final assembly having better precision (e.g., a uniform gap dimensions along the longitudinal axis of the ion source). Modular components may be designed to have common characteristics so as to allow use of these components in ion sources of varying sizes. A modular gas distribution system uniformly distributes a working gas to the ionization region of the module ion source. For each gas distribution module, gas distribution channels and baffles are laid out relative to the module joints to prevent gas leakage. Furthermore, gas manifolds and supply channels are used to bridge module joints while uniformly distributing the working gas to the ALS.
    Type: Application
    Filed: July 21, 2004
    Publication date: March 3, 2005
    Inventors: Daniel Siegfried, David Burtner, Scott Townsend, John Keem, Mark Krivoruchko, Valery Alexeyey, Vsevolod Zelenkov
  • Publication number: 20050040031
    Abstract: Shielding associated with an ion source, such as an anode layer source, reduces the amount and/or concentration of sputtered contaminants impinging and remaining on the surface of a target substrate. While passing the ion beam through to the target substrate, shielding can reduce the total amount of sputtered contaminants impinging the substrate before, during, and/or after passage of the substrate through the envelope of the etching beam. Particularly, a shield configuration that blocks the contaminants from impinging the substrate after the substrate passes through the etching beam (i.e., outside of the envelope of the etching beam) yields a higher quality substrate with reduced substrate contamination.
    Type: Application
    Filed: August 16, 2004
    Publication date: February 24, 2005
    Inventors: David Burtner, Daniel Siegfried, Richard Blacker, Valery Alexeyev, John Keem, Vsevolod Zelenkov, Mark Krivoruchko
  • Publication number: 20030221749
    Abstract: Magnetic materials having a coercivity not less than about 1000 Oersted are prepared in a single step procedure. A molten mixture of a desired composition having a relatively high boron content is cooled at a rate slower than about 105 degrees Celsius per second. Preferably, the molten mixture is cooled by depositing it on a chilled surface such that it forms a layer between about 120 and about 300, and preferably between about 120 and about 150, microns thick.
    Type: Application
    Filed: February 24, 2003
    Publication date: December 4, 2003
    Applicant: Pioneer Metals and Technology, Inc.
    Inventor: John Keem
  • Patent number: 6524399
    Abstract: Magnetic materials having a coercivity not less than about 1000 Oersted are prepared in a single step procedure. A molten mixture of a desired composition having a relatively high boron content is cooled at a rate slower than about 105 degrees Celsius per second. Preferably, the molten mixture is cooled by depositing it on a chilled surface such that it forms a layer between about 120 and about 300, and preferably between about 120 and about 150, microns thick.
    Type: Grant
    Filed: March 5, 1999
    Date of Patent: February 25, 2003
    Assignee: Pioneer Metals and Technology, Inc.
    Inventor: John Keem
  • Patent number: 5403408
    Abstract: A permanent magnet material having the formula, in atomic %:TM.sub.(84.3.-w-z) RE.sub.(3.0+w) B.sub.(12.7+z),wherein -3.3.ltoreq.z<3.3 and -2.0.ltoreq.w<2.0; orTM.sub.(89.8-x-y) RE.sub.(3.5+y) B.sub.(6.7+x),wherein -2.5.ltoreq.y<2.5 and -2.7.ltoreq.x.ltoreq.2.7; orTM.sub.(96.5-q-r) RE.sub.(1+q) B.sub.(2.5+r),wherein -1.5.ltoreq.r.ltoreq.1.5 and 0.ltoreq.q<6.5-r; and wherein TM is a transition metal, RE is a rare earth metal, and B is boron or a combination of boron and carbon. The permanent magnet materials include at least weight percent non-uniaxial material and possess a coercivity of at least 1,000 Oersteds.
    Type: Grant
    Filed: October 19, 1992
    Date of Patent: April 4, 1995
    Assignee: Inland Steel Company
    Inventors: Robert F. Krause, John Keem, Jun S. Im, Su Cronogue
  • Patent number: 5116434
    Abstract: Disclosed is a method for forming a high magnetic parameter ferromagnetic material. The material has a distribution of magnetic parameters as solidified, and is separated into a first fraction having relatively high magnetic parameters and a second fraction having relatively low magnetic parameters. The method comprises applying a magnetic field to the materials, the magnetic field being high enough to magnetize the low magnetic parameter fraction, but low enough to avoid substantially magnetization of the high parameter fraction. Thereafter the fractions of material are magnetically separated.
    Type: Grant
    Filed: March 19, 1991
    Date of Patent: May 26, 1992
    Assignee: Ovonic Synthetic Materials Company, Inc.
    Inventors: John Keem, Jun S. Im
  • Patent number: 4867785
    Abstract: Disclosed is a controlled pressure melt spinning method of rapidly solidifying alloys to obtain a solid alloy of controlled mean crystallite size, narrow crystallite distribution, and a fine grain microstructure.
    Type: Grant
    Filed: May 9, 1988
    Date of Patent: September 19, 1989
    Assignee: Ovonic Synthetic Materials Company, Inc.
    Inventors: John Keem, Jun S. Im, John Tyler, Richard Bergeron, Kevin Dennis, David Hoeft
  • Patent number: 4834811
    Abstract: Disclosed is a method for separating initially non-magnetized ferromagnetic material. The material has a distribution of magnetic parameters, and is separated into a first fraction having relatively high magnetic parameters and a second fraction having relatively low magnetic parameters. The method comprises applying a magnetic field to the materials, the magnetic field being high enough to magnetize the low magnetic parameter fraction, but low enough to avoid substantial magnetization of the high parameter fraction. Thereafter the fractions of material are magnetically separated.
    Type: Grant
    Filed: June 19, 1987
    Date of Patent: May 30, 1989
    Assignee: Ovonic Synthetic Materials Company
    Inventors: John Keem, Jun S. Im
  • Patent number: 4727000
    Abstract: X-ray dispersive and reflective structures and materials are provided which exhibit at least one third of the theoretical integral reflection coefficient for the structures in the range of interest without fluorescence or absorption edges. The materials can be thermally activated to control the desired properties, during or post deposition. The structures can be deposited by ion beam absorption techniques to form the structures in a precise manner. The index of the refraction of the structures can be continuously varying throughout the structures.
    Type: Grant
    Filed: June 18, 1986
    Date of Patent: February 23, 1988
    Assignee: Ovonic Synthetic Materials Co., Inc.
    Inventors: Stanford R. Ovshinsky, John Keem, Steven A. Flessa, James L. Wood, Keith L. Hart, Lennard Sztaba
  • Patent number: 4675739
    Abstract: An incident radiation sensing apparatus comprises an array of photosensitive elements formed as an integrated circuit on a substrate. Each of the photosensitive elements includes a capacitor for storing charge, a conductive means for charging the capacitor to a preselected magnitude, a blocking means for inhibiting the discharge of charge stored on the capacitor; and a photoresponsive means formed from deposited semiconductor material for generating charge carriers at a rate responsive to the intensity of radiation incident upon the photoresponsive means. The photoresponsive means is connected to the capacitor so that the charge carriers generated in the photoresponsive means reduce the magnitude of the charge on the capacitor as a function of the magnitude of, and the time incidence of, the incident radiation.
    Type: Grant
    Filed: March 20, 1985
    Date of Patent: June 23, 1987
    Assignee: Energy Conversion Devices, Inc.
    Inventors: Clive Catchpole, Zvi Yaniv, Vincent D. Cannella, John Keem, Louis D. Swartz
  • Patent number: 4568614
    Abstract: Disclosed is a coated steel article, e.g., a stainless steel article, having a corrosion resistant coating of disordered silicon carboxynitride over at least a portion of the steel surface. Also disclosed is a method of forming an adherent, ductile, disordered silicon carboxynitride coating on a steel substrate by glow discharge deposition.
    Type: Grant
    Filed: June 27, 1984
    Date of Patent: February 4, 1986
    Assignee: Energy Conversion Devices, Inc.
    Inventors: Erwin Eichen, John Keem