Patents by Inventor John L. Roth

John L. Roth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • BRM Targeting Compounds And Associated Methods Of Use
    Publication number: 20240165244
    Abstract: The disclosure is directed to compounds of Formula I Pharmaceutical compositions comprising compounds of Formula I, as well as methods of their use and preparation, are also described.
    Type: Application
    Filed: September 15, 2023
    Publication date: May 23, 2024
    Inventors: Corey Howard Basch, Song Mei, Liang Liu, Artem Shvartsbart, Andrew Paul Combs, John A. Rose, Klare L. Bersch, Sina Rezazadeh, Vijayarajan Devannah, Danielle Beam Roth
  • Hard-mask composition
    Patent number: 10438808
    Abstract: Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
    Type: Grant
    Filed: May 25, 2016
    Date of Patent: October 8, 2019
    Assignee: IRRESISTIBLE MATERIALS, LTD
    Inventors: Alex Philip Graham Robinson, Thomas Lada, John L. Roth, Alan G. Brown, Andreas Frommhold, Edward A. Jackson
  • HARD-MASK COMPOSITION
    Publication number: 20170345669
    Abstract: Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.
    Type: Application
    Filed: May 25, 2016
    Publication date: November 30, 2017
    Inventors: Alex Philip Graham Robinson, Thomas Lada, John L. Roth, Alan G. Brown, Andreas Frommhold, Edward A. Jackson
  • Composition of matter and molecular resist made therefrom
    Patent number: 9519215
    Abstract: The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms and A? is an anion.
    Type: Grant
    Filed: December 21, 2015
    Date of Patent: December 13, 2016
    Assignee: IRRESISTIBLE MATERIALS, LTD
    Inventors: Alex Phillip Graham Robinson, Dongxu Yang, Andreas Frommhold, Thomas Lada, John L. Roth, Xiang Xue, Edward A. Jackson
  • Composition of Matter and Molecular Resist Made Therefrom
    Publication number: 20160246173
    Abstract: The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms and A? is an anion.
    Type: Application
    Filed: December 21, 2015
    Publication date: August 25, 2016
    Inventors: Alex Phillip Graham Robinson, Dongxu Yang, Andreas Frommhold, Thomas Lada, John L. Roth, Xiang Xue, Edward A. Jackson
  • Composition of matter and molecular resist made therefrom
    Patent number: 9229322
    Abstract: Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: January 5, 2016
    Inventors: Alex Phillip Graham Robinson, Dongxu Yang, Andreas Frommhold, Thomas Lada, John L. Roth, Xiang Xue, Edward A. Jackson
  • Composition of matter and molecular resist made therefrom
    Patent number: 9122156
    Abstract: Disclosed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); at least one photo acid generator; at least one crosslinker; and at least one solvent; wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: September 1, 2015
    Inventors: Alex Philip Graham Robinson, Dongxu Yang, Andreas Frommhold, Thomas Lada, John L. Roth, Xiang Xue, Edward A. Jackson
  • Composition of Matter and Molecular Resist Made Therefrom
    Publication number: 20150140489
    Abstract: Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.
    Type: Application
    Filed: October 21, 2014
    Publication date: May 21, 2015
    Inventors: Alex Philip Graham Robinson, Dongxu Yang, Andreas Frommhold, Thomas Lada, John L. Roth, Xiang Xue
  • Composition of Matter and Molecular Resist Made Therefrom
    Publication number: 20150140491
    Abstract: Disclosed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); at least one photo acid generator; at least one crosslinker; and at least one solvent; wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.
    Type: Application
    Filed: October 21, 2014
    Publication date: May 21, 2015
    Inventors: Alex Philip Graham Robinson, Dongxu Yang, Andreas Frommhold, Thomas Lada, John L. Roth, Xiang Xue