Patents by Inventor John Lesoine
John Lesoine has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11796390Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.Type: GrantFiled: July 1, 2022Date of Patent: October 24, 2023Assignee: KLA CorporationInventors: Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen, Stilian Pandev, John Lesoine, Qiang Zhao, Liequan Lee, Houssam Chouaib, Ming Di, Torsten R. Kaack, Andrei V. Shchegrov, Zhengquan Tan
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Publication number: 20220349752Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.Type: ApplicationFiled: July 1, 2022Publication date: November 3, 2022Inventors: Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen, Stilian Pandev, John Lesoine, Qiang Zhao, Liequan Lee, Houssam Chouaib, Ming Di, Torsten R. Kaack, Andrei V. Shchegrov, Zhengquan Tan
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Patent number: 11378451Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.Type: GrantFiled: August 8, 2017Date of Patent: July 5, 2022Assignee: KLA CorporationInventors: Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen, Stilian Pandev, John Lesoine, Qiang Zhao, Liequan Lee, Houssam Chouaib, Ming Di, Torsten R. Kaack, Andrei V. Shchegrov, Zhengquan Tan
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Patent number: 10605722Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.Type: GrantFiled: December 8, 2017Date of Patent: March 31, 2020Assignee: KLA-Tencor CorporationInventors: Hidong Kwak, John Lesoine, Malik Sadiq, Lanhua Wei, Shankar Krishnan, Leonid Poslavsky, Mikhail M. Sushchik
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Publication number: 20190041266Abstract: A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.Type: ApplicationFiled: August 8, 2017Publication date: February 7, 2019Inventors: Tianhan Wang, Aaron Rosenberg, Dawei Hu, Alexander Kuznetsov, Manh Dang Nguyen, Stilian Pandev, John Lesoine, Qiang Zhao, Liequan Lee, Houssam Chouaib, Ming Di, Torsten R. Kaack, Andrei V. Shchegrov, Zhengquan Tan
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Publication number: 20180100796Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.Type: ApplicationFiled: December 8, 2017Publication date: April 12, 2018Inventors: Hidong Kwak, John Lesoine, Malik Sadiq, Lanhua Wei, Shankar Krishnan, Leonid Poslavsky, Mikhail M. Sushchik
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Patent number: 9857291Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.Type: GrantFiled: May 15, 2014Date of Patent: January 2, 2018Assignee: KLA-Tencor CorporationInventors: Hidong Kwak, John Lesoine, Malik Sadiq, Lanhua Wei, Shankar Krishnan, Leonid Poslavsky, Mikhail M. Sushchik
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Publication number: 20140340682Abstract: Methods and systems for matching measurement spectra across one or more optical metrology systems are presented. The values of one or more system parameters used to determine the spectral response of a specimen to a measurement performed by a target metrology system are optimized. The system parameter values are optimized such that differences between measurement spectra generated by a reference system and the target system are minimized for measurements of the same metrology targets. Methods and systems for matching spectral errors across one or more optical metrology systems are also presented. A trusted metrology system measures the value of at least one specimen parameter to minimize model errors introduced by differing measurement conditions present at the time of measurement by the reference and target metrology systems. Methods and systems for parameter optimization based on low-order response surfaces are presented to reduce the compute time required to refine system calibration parameters.Type: ApplicationFiled: May 15, 2014Publication date: November 20, 2014Inventors: Hidong Kwak, John Lesoine, Malik Sadiq, Lanhua Wei, Shankar Krishnan, Leonid Poslavsky, Mikhail M. Sushchik