Patents by Inventor John M. Hartman

John M. Hartman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4270144
    Abstract: Various techniques for merging charge into and splitting charge from CCD's are described. Specifically disclosed in detail is a racetrack shaped charge coupled device (CCD), provided with special input and output stations operating on the principle of progressive charge read in and readout. During read in (which is a special case of charge merging), charge is injected in the direction of prevailing charge flow in the main channel of the CCD, with the injected charge packets being transferred laterally into the main charge stream while being stepped forward in the channel. During readout (which is a special case of charge splitting), charge is transferred from the main channel to an auxiliary channel through a plurality of interconnecting ports and, as during read in, transfer of a given charge packet takes place over a time period during which the charge packet is stepped forward in the main channel through several storage sites.
    Type: Grant
    Filed: June 3, 1977
    Date of Patent: May 26, 1981
    Assignee: Hughes Aircraft Company
    Inventors: John M. Hartman, Arthur L. Lancaster
  • Patent number: 4222165
    Abstract: This invention provides the structure for a two-phase charge coupled storage device. Alternate regions of thicker and thinner silicon dioxide are grown upon a silicon substrate. These silicon dioxide regions are covered with a layer of deposited, undoped polysilicon. A layer of silicon dioxide is grown over the polysilicon. Ion implantation is applied to cause isolated regions of conductivity in the polysilicon. Then contact windows are cut in the upper most layer of silicon dioxide exposing the polysilicon therethrough and a metal coating is deposited in the contact windows. Two-phase signals are applied to the resulting electrodes to advance charges at the surface of the silicon substrate.
    Type: Grant
    Filed: September 25, 1978
    Date of Patent: September 16, 1980
    Assignee: EMM Semi, Inc.
    Inventors: John M. Hartman, George S. Leach
  • Patent number: 4156247
    Abstract: This invention provides the structure for a two-phase charge coupled storage device. Alternate regions of thicker and thinner silicon dioxide are grown upon a silicon substrate. These silicon dioxide regions are covered with a layer of deposited, undoped polysilicon. A layer of silicon dioxide is grown over the polysilicon. Ion implantation is applied to cause isolated regions of conductivity in the polysilicon. Then contact windows are cut in the upper most layer of silicon dioxide exposing the polysilicon therethrough and a metal coating is deposited in the contact windows. Two-phase signals are applied to the resulting electrodes to advance charges at the surface of the silicon substrate.
    Type: Grant
    Filed: December 15, 1976
    Date of Patent: May 22, 1979
    Assignee: Electron Memories & Magnetic Corporation
    Inventors: John M. Hartman, George S. Leach
  • Patent number: 4093872
    Abstract: Signals generated by an infrared (I.R.) detector are injected directly into a charge coupled device (CCD) by means of a DC biased electrode structure interposed between the detector and one of the clocked transfer electrodes of the CCD.
    Type: Grant
    Filed: September 2, 1975
    Date of Patent: June 6, 1978
    Assignee: Hughes Aircraft Company
    Inventors: John M. Hartman, Darrell M. Erb