Patents by Inventor John M. O'Donnell

John M. O'Donnell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Double-sided polishing of hard substrate materials
    Patent number: 9427841
    Abstract: Disclosed is a method and apparatus for simultaneously polishing both surfaces of an optical substrate. An upper platen and a lower platen, each covered with a polishing pad material and at least one carrier having an aperture for holding the optical substrate between the platens are provided. The location of the aperture of the carrier is set such that the center of the optical substrate is offset from the center of the carrier and at least a portion of the outer perimeter of the optical substrate extends outwardly beyond at least a portion of at least one of the outer perimeter and the inner perimeter of the platens. The platens are rotated with respect to the carrier, and the carrier is rotated with respect to the platens to polish the optical substrate. The location of the aperture of the carrier is adjustable.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: August 30, 2016
    Assignee: II-VI Incorporated
    Inventors: Samuel J. Goldstein, Stephen M. Miller, III, John M. O'Donnell
  • Double-Sided Polishing of Hard Substrate Materials
    Publication number: 20140273760
    Abstract: Disclosed is a method and apparatus for simultaneously polishing both surfaces of an optical substrate. An upper platen and a lower platen, each covered with a polishing pad material and at least one carrier having an aperture for holding the optical substrate between the platens are provided. The location of the aperture of the carrier is set such that the center of the optical substrate is offset from the center of the carrier and at least a portion of the outer perimeter of the optical substrate extends outwardly beyond at least a portion of at least one of the outer perimeter and the inner perimeter of the platens. The platens are rotated with respect to the carrier, and the carrier is rotated with respect to the platens to polish the optical substrate. The location of the aperture of the carrier is adjustable.
    Type: Application
    Filed: March 17, 2014
    Publication date: September 18, 2014
    Applicant: II-VI Incorporated
    Inventors: Samuel J. Goldstein, Stephen M. Miller, III, John M. O'Donnell