Patents by Inventor John Marshall, III

John Marshall, III has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5298137
    Abstract: An emission enhanced sputtering magnetron apparatus includes an elongated rod or bar like cathode jacketed by a target material. An electron emission enhancement device positioned around the end of the elongated cathode creates a thin, highly uniform plasma sheath along the remainder of the cathode, thereby enhancing the sputtering rate along the entire length of the cathode target material. A low voltage, high current AC or DC magnet supply connected across the elongated cathode generates a plasma-confining magnetic field circumferentially around the entire length of the cathode. In an alternate embodiment, a single elongated tube or bar of the target material can be conformed into the cathode, the electron emission enhancing device, and a working end portion that can be formed into nearly any shape to conform to the shape of the surface being coated with the target material.
    Type: Grant
    Filed: October 1, 1992
    Date of Patent: March 29, 1994
    Assignee: Surface Solutions, Inc.
    Inventor: John Marshall, III
  • Patent number: 4946793
    Abstract: The instrument of the present invention is designed to electrically alter membranes of vesicles in a suspension in order to perform vesicular alteration and electrostructuring of the membranes. The instrument includes a supply for delivering voltage to a pulse forming network. The output of the pulse forming network is selectively switched to deliver one or a plurality of output pulses across a chamber holding the suspension. Disposed in the chamber are a pair of electrodes which define a geometry for applying either a non-uniform field across the suspension or defining a uniform field across the suspension. The present invention is not limited to the type of field uniformity. Connected in parallel across the electrodes is a device for matching the impedance of the chamber containing the suspension of vesicles. This device is in parallel combination with the chamber and when properly adjusted, matches the impedance of the chamber to the pulse forming network.
    Type: Grant
    Filed: December 12, 1988
    Date of Patent: August 7, 1990
    Assignee: Electropore, Inc.
    Inventor: John Marshall, III
  • Patent number: 4923814
    Abstract: A high speed, high voltage apparatus using homogeneous, uniform electric fields to treat vesicles carried in a suspension. In one embodiment, parallel electrodes are used to perform dielectrophoretic bunching, rotational prealignment, electro-fusion, and poration of vesicles. In another embodiment, a magnetic electrodeless apparatus is used to perform the treatment. Both embodiments are driven by a high speed, high voltage electronic supply system that utilizes a triggered ionization breakdown delivery system.
    Type: Grant
    Filed: April 26, 1989
    Date of Patent: May 8, 1990
    Assignee: Electropore, Inc.
    Inventor: John Marshall, III
  • Patent number: 4906576
    Abstract: A high speed, high voltage apparatus using homogeneous, uniform electric fields to treat vesicles carried in a suspension. In one embodiment, parallel electrodes are used to perform dielectrophoretic bunching, rotational prealignment, electro-fusion, and poration of vesicles. In another embodiment, a magnetic electrodeless apparatus is used to perform the treatment. Both embodiments are driven by a high speed, high voltage electronic supply system that utilizes a triggered ionization breakdown delivery system.
    Type: Grant
    Filed: May 8, 1987
    Date of Patent: March 6, 1990
    Assignee: Electropore, Inc.
    Inventor: John Marshall, III
  • Patent number: 4849089
    Abstract: An electromanipulation chamber for selectively holding a suspension of vesicles is disclosed having a one-piece holder molded from dielectric material wherein the holder comprises an outer cylindrically-shaped collar and an inner circular-shaped ring having a formed annular region centrally located therein. A passageway is formed through the ring and the collar and a pair of electrodes having a diameter slightly greater than the inner diameter of the collar is mounted on opposing sides of the annular region. The pair of electrodes and the annular region form the electromanipulation chamber and a positive fluid-tight seal is formed aournd the edges of the annular region with electrodes to contain the suspension with the vesicles.
    Type: Grant
    Filed: February 21, 1989
    Date of Patent: July 18, 1989
    Assignee: Electropore, Inc.
    Inventor: John Marshall, III