Abstract: Performance of mass flow controller may be vulnerable to pressure transients in a flow path to which the controller is coupled for the purpose of controlling the fluid flow. A system and method are provided for reducing or eliminate performance degradations, instabilities, and/or inaccuracies of a mass flow controller caused by changes in the pressure environment. In particular, a method and system are provided for compensating for pressure transients in the pressure environment of a flow path and mass flow controller.

Abstract: A system and method of characterizing or controlling a flow of a fluid is provided that involves a sensor conduit and a bypass. A plurality of fluids may be utilized in the flow control device based on characteristic information of the device generated during calibration thereof. The characteristic information, in turn is based on a dimensionless parameters, such as adjusted dynamic pressure and adjusted Reynolds number.

Abstract: A method and apparatus for blending and supplying process materials. The method and apparatus are particularly applicable to the blending of ultra-high purity chemicals, the blending of abrasive slurries with other chemicals for the polishing of semiconductor wafers, and high-accuracy blending of chemicals. The apparatus may include a dispensing subsystem that supplies process materials to a mixing subsystem where they are blended with a static mixer. The method may include supplying process materials with a dispensing subsystem and blending the process materials in a static mixer.

Abstract: A system and method of compensating for pressure variations in a flow controller entails the use of the compressibility of the gas being controlled to provide a more accurate measurement of the flow.

Abstract: A method and apparatus for blending and supplying process materials. The method and apparatus are particularly applicable to the blending of ultra-high purity chemicals, the blending of abrasive slurries with other chemicals for the polishing of semiconductor wafers, and high-accuracy blending of chemicals. The apparatus may include a dispensing subsystem that supplies process materials to a mixing subsystem where they are blended with a static mixer. The method may include supplying process materials with a dispensing subsystem and blending the process materials in a static mixer.

Abstract: A thermal mass flow controller or mass flow meter having a novel sensor housing that reduces heat conduction from the housing mounting plate or base to the sensor itself. The housing also greatly minimizes the thermal gradient that can result from the uneven application of heat to the housing base. This reduction is accomplished in part by the use of one or more thermal isolation slots to isolate the upper portion of the housing (which holds the sensor) from the lower portion of the housing. Heat transfer to the sensor housing is also minimized by raising the middle portion of the bottom of the housing so that thermal contact is made between the base and the housing only at the two ends of the housing.

Abstract: A system and method of compensating for pressure variations in a flow controller entails the use of the compressibility of the gas being controlled to provide a more accurate measurement of the flow.

Abstract: A thermal mass flow controller or mass flow meter having a novel sensor housing that reduces heat conduction from the housing mounting plate or base to the sensor itself. The housing also greatly minimizes the thermal gradient that can result from the uneven application of heat to the housing base. This reduction is accomplished in part by the use of one or more thermal isolation slots to isolate the upper portion of the housing (which holds the sensor) from the lower portion of the housing. Heat transfer to the sensor housing is also minimized by raising the middle portion of the bottom of the housing so that thermal contact is made between the base and the housing only at the two ends of the housing.

Abstract: Performance of mass flow controller may be vulnerable to pressure transients in a flow path to which the controller is coupled for the purpose of controlling the fluid flow. A system and method are provided for reducing or eliminate performance degradations, instabilities, and/or inaccuracies of a mass flow controller caused by changes in the pressure environment. In particular, a method and system are provided for compensating for pressure transients in the pressure environment of a flow path and mass flow controller.

Abstract: Performance of mass flow controller may be vulnerable to pressure transients in a flow path to which the controller is coupled for the purpose of controlling the fluid flow. A system and method are provided for reducing or eliminate performance degradations, instabilities, and/or inaccuracies of a mass flow controller caused by changes in the pressure environment. In particular, a method and system are provided for compensating for pressure transients in the pressure environment of a flow path and mass flow controller.

Abstract: Performance of mass flow controller may be vulnerable to pressure transients in a flow path to which the controller is coupled for the purpose of controlling the fluid flow. A system and method are provided for reducing or eliminate performance degradations, instabilities, and/or inaccuracies of a mass flow controller caused by changes in the pressure environment. In particular, a method and system are provided for compensating for pressure transients in the pressure environment of a flow path and mass flow controller.

Abstract: A resistive bridge sensor circuit that includes a first resistive bridge circuit having a first variable resistance resistor and a second resistive bridge circuit having a second variable resistance resistor. The first and second resistive bridge circuits share at least a portion of a common reference leg that sets a resistance of a first and second variable resistors. The common reference leg or a portion of the common reference leg is alternately switchably connected to one of the first and second resistive bridge circuits.

Abstract: Performance of mass flow controller may be vulnerable to pressure transients in a flow path to which the controller is coupled for the purpose of controlling the fluid flow. A system and method are provided for reducing or eliminate performance degradations, instabilities, and/or inaccuracies of a mass flow controller caused by changes in the pressure environment. In particular, a method and system are provided for compensating for pressure transients in the pressure environment of a flow path and mass flow controller.

Abstract: A method and apparatus for blending and supplying process materials. The method and apparatus are particularly applicable to the blending of ultra-high purity chemicals, the blending of abrasive slurries with other chemicals for the polishing of semiconductor wafers, and high-accuracy blending of chemicals. The apparatus may include a dispensing subsystem that supplies process materials to a mixing subsystem where they are blended with a static mixer. The method may include supplying process materials with a dispensing subsystem and blending the process materials in a static mixer.

Abstract: A resistive bridge sensor circuit that includes a first resistive bridge circuit having a first variable resistance resistor and a second resistive bridge circuit having a second variable resistance resistor. The first and second resistive bridge circuits share at least a portion of a common reference leg that sets a resistance of a first and second variable resistors. The common reference leg or a portion of the common reference leg is alternately switchably connected to one of the first and second resistive bridge circuits.

Abstract: A resistive bridge sensor circuit that includes a first resistive bridge circuit having a first variable resistance resistor and a second resistive bridge circuit having a second variable resistance resistor. The first and second resistive bridge circuits share at least a portion of a common reference leg that sets a resistance of a first and second variable resistors. The common reference leg or a portion of the common reference leg is alternately switchably connected to one of the first and second resistive bridge circuits.

Abstract: Performance of mass flow controller may be vulnerable to pressure transients in a flow path to which the controller is coupled for the purpose of controlling the fluid flow. A system and method are provided for reducing or eliminate performance degradations, instabilities, and/or inaccuracies of a mass flow controller caused by changes in the pressure environment. In particular, a method and system are provided for compensating for pressure transients in the pressure environment of a flow path and mass flow controller.

Abstract: A method and apparatus for blending and supplying process materials. The method and apparatus are particularly applicable to the blending of ultra-high purity chemicals, the blending of abrasive slurries with other chemicals for the polishing of semiconductor wafers, and high-accuracy blending of chemicals. The apparatus may include a dispensing subsystem that supplies process materials to a mixing subsystem where they are blended with a static mixer. The method may include supplying process materials with a dispensing subsystem and blending the process materials in a static mixer.

Abstract: A sensor that includes a first resistor, a second resistor, a first circuit, and a second circuit. The first and second resistors each has a resistance that varies in response to a change in a physical property. The first circuit is electrically coupled to the first resistor and sets the resistance of the first resistor. The second circuit is electrically coupled to the second resistor and adjusts the resistance of the second resistor to equal the resistance of the first resistor. A processing circuit may be coupled to the first and second circuits to measure a difference in an amount of energy provided by the first and second circuits to the first and second resistors, respectively.

Abstract: A method and apparatus for blending and supplying process materials. The method and apparatus are particularly applicable to the blending of ultra-high purity chemicals, the blending of abrasive slurries with other chemicals for the polishing of semiconductor wafers, and high-accuracy blending of chemicals. The apparatus may include a dispensing subsystem that supplies process materials to a mixing subsystem where they are blended with a static mixer. The method may include supplying process materials with a dispensing subsystem and blending the process materials in a static mixer.