Patents by Inventor John Michael Sherer

John Michael Sherer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Low pressure drop canister for fixed bed scrubber applications and method of using same
    Publication number: 20080134887
    Abstract: An apparatus and method for abating toxic and/or hazardous gas species in a diluent gas stream line deriving from a by-pass line of a semiconductor process tool, comprising contacting the diluent gas stream with a dry resin sorbent material having an affinity for the toxic and/or hazardous gas species to effect the removal of at least a portion of the toxic and/or hazardous gas species by a chemisorbent or physisorbent reaction between the sorbent bed and the toxic gas component effectively reduces the concentration of the toxic gas component in the process diluent stream to below TLV.
    Type: Application
    Filed: January 29, 2008
    Publication date: June 12, 2008
    Inventor: John Michael Sherer
  • Abatement system targeting a by-pass effluent stream of a semiconductor process tool
    Patent number: 7323042
    Abstract: An apparatus and method for abating toxic and/or hazardous gas species in a diluent gas stream line deriving from a by-pass line of a semiconductor process tool, comprising contacting the diluent gas stream with a dry resin sorbent material having an affinity for the toxic and/or hazardous gas species to effect the removal of at least a portion of the toxic and/or hazardous gas species by a chemisorbent or physisorbent reaction between the sorbent bed and the toxic gas component effectively reduces the concentration of the toxic gas component in the process diluent stream to below TLV.
    Type: Grant
    Filed: December 16, 2004
    Date of Patent: January 29, 2008
    Assignee: Applied Materials, Inc.
    Inventor: John Michael Sherer
  • Abatement system targeting a by-pass effluent stream of a semiconductor process tool
    Patent number: 6843830
    Abstract: An apparatus and method for abating toxic and/or hazardous gas species in a diluent gas stream line deriving from a by-pass line of a semiconductor process tool, comprising contacting the diluent gas stream with a dry resin sorbent material having an affinity for the toxic and/or hazardous gas species to effect the removal of at least a portion of the toxic and/or hazardous gas species by a chemisorbent or physisorbent reaction between the sorbent bed and the toxic gas component effectively reduces the concentration of the toxic gas component in the process diluent stream to below TLV.
    Type: Grant
    Filed: April 15, 2003
    Date of Patent: January 18, 2005
    Assignee: Advanced Technology Materials, Inc.
    Inventor: John Michael Sherer
  • Abatement system targeting a by-pass effluent stream of a semiconductor process tool
    Publication number: 20040206237
    Abstract: An apparatus and method for abating toxic and/or hazardous gas species in a diluent gas stream line deriving from a by-pass line of a semiconductor process tool, comprising contacting the diluent gas stream with a dry resin sorbent material having an affinity for the toxic and/or hazardous gas species to effect the removal of at least a portion of the toxic and/or hazardous gas species by a chemisorbent or physisorbent reaction between the sorbent bed and the toxic gas component effectively reduces the concentration of the toxic gas component in the process diluent stream to below TLV.
    Type: Application
    Filed: April 15, 2003
    Publication date: October 21, 2004
    Inventor: John Michael Sherer
  • Scrubber system for pretreatment of an effluent waste stream containing arsenic
    Publication number: 20040185661
    Abstract: A point of use scrubber system for pre-treating an effluent waste stream comprising an arsenic component, deriving from a compound semiconductor etch process tool. The system uses a scrubber comprising a sorbent bed, which contacts the arsenic component and retains thereon the arsenic component through a chemisorption or physisorption reaction. The scrubber is located in the exhaust line of the etch process tool's exhaust pump, upstream of a main abatement system.
    Type: Application
    Filed: March 17, 2003
    Publication date: September 23, 2004
    Inventor: John Michael Sherer