Patents by Inventor John Mitchels

John Mitchels has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240426717
    Abstract: A sample is milled to expose the region of interest (ROI) within the sample, while being held by a sample stage in a microscopy system. The sample is milled based on the ROI location determined with sample images acquired with light beam irradiating from different axes. The sample images are acquired while the sample is held using the same sample stage for milling.
    Type: Application
    Filed: June 3, 2024
    Publication date: December 26, 2024
    Inventors: Jakub Kuba, Pavel Krepelka, Miloš Hovorka, John Mitchels, Radim Kríž, Matej Dolník
  • Publication number: 20240162001
    Abstract: The present invention provides a method of sample preparation and analysis and a sample holder that may be used in said method.
    Type: Application
    Filed: July 27, 2023
    Publication date: May 16, 2024
    Inventors: Michal Valík, Petr Malek, John Mitchels, František Vaške, Veronika Vrbovská, Miloš Hovorka
  • Patent number: 11802823
    Abstract: The invention relates to a Cryo-Charged Particle (CCP) sample handling and storage system. The system is used for storing and handling cryo-samples for use in charged particle microscopy, such as cryo-electron microscope samples for use in cryo-transmission electron microscopy. The system comprises a storage apparatus for storing a plurality of CCP samples, and a Charged Particle Apparatus (CPA), such as a cryo-TEM, at a location remote from said storage apparatus. The system further comprises a transfer device that is releasably connectable to said storage apparatus, and that is releasably connectable to said CPA as well. As defined herein, said transfer device is arranged for acquiring a CCP sample from said plurality of CCP samples when connected to said storage apparatus, and arranged for transferring said CCP sample from said transfer device to said CPA when connected to said CPA.
    Type: Grant
    Filed: November 10, 2021
    Date of Patent: October 31, 2023
    Assignee: FEI Company
    Inventors: Vojt{hacek over (e)}ch Dole{hacek over (z)}al, Hans Persoon, John Mitchels
  • Publication number: 20220155193
    Abstract: The invention relates to a Cryo-Charged Particle (CCP) sample handling and storage system. The system is used for storing and handling cryo-samples for use in charged particle microscopy, such as cryo-electron microscope samples for use in cryo-transmission electron microscopy. The system comprises a storage apparatus for storing a plurality of CCP samples, and a Charged Particle Apparatus (CPA), such as a cryo-TEM, at a location remote from said storage apparatus. The system further comprises a transfer device that is releasably connectable to said storage apparatus, and that is releasably connectable to said CPA as well. As defined herein, said transfer device is arranged for acquiring a CCP sample from said plurality of CCP samples when connected to said storage apparatus, and arranged for transferring said CCP sample from said transfer device to said CPA when connected to said CPA.
    Type: Application
    Filed: November 10, 2021
    Publication date: May 19, 2022
    Applicant: FEI Company
    Inventors: Vojtech Dolezal, Hans Persoon, John Mitchels
  • Patent number: 10475629
    Abstract: A charged-particle microscope, comprising a vacuum chamber in which are provided: A specimen holder for holding a specimen in an irradiation position; A particle-optical column, for producing a charged particle beam and directing it so as to irradiate the specimen; A detector, for detecting a flux of radiation emanating from the specimen in response to irradiation by said beam, wherein: Said vacuum chamber comprises an in situ magnetron sputter deposition module, comprising a magnetron sputter source for producing a vapor stream of target material; A stage is configured to move a sample comprising at least part of said specimen between said irradiation position and a separate deposition position at said deposition module; Said deposition module is configured to deposit a layer of said target material onto said sample when held at said deposition position.
    Type: Grant
    Filed: June 1, 2016
    Date of Patent: November 12, 2019
    Assignee: FEI Company
    Inventors: John Mitchels, Rudolf Johannes Peter Gerardus Schampers, Michal Hrouzek, Tomas Gardelka
  • Patent number: 10170275
    Abstract: Surface modification of a cryogenic specimen can be obtained using a charged particle microscope. A specimen is situated in a vacuum chamber on a specimen holder and maintained at a cryogenic temperature. The vacuum chamber is evacuated and a charged-particle beam is directed to a portion of the specimen so as to modify a surface thereof. A thin film monitor is situated in the vacuum chamber and has at least a detection surface maintained at a cryogenic temperature. A precipitation rate of frozen condensate in the vacuum chamber is measured using the thin film monitor, and based on the measured precipitation rate, the surface modification is initiated when the precipitation rate is less than a first pre-defined threshold, or interrupted if the precipitation rate rises above a second pre-defined threshold.
    Type: Grant
    Filed: October 18, 2017
    Date of Patent: January 1, 2019
    Assignee: FEI Company
    Inventors: John Mitchels, Tomá{hacek over (s)} Vystav{hacek over (e)}l, Martin Cafourek
  • Publication number: 20180114671
    Abstract: Surface modification of a cryogenic specimen can be obtained using a charged particle microscope. A specimen is situated in a vacuum chamber on a specimen holder and maintained at a cryogenic temperature. The vacuum chamber is evacuated and a charged-particle beam is directed to a portion of the specimen so as to modify a surface thereof. A thin film monitor is situated in the vacuum chamber and has at least a detection surface maintained at a cryogenic temperature. A precipitation rate of frozen condensate in the vacuum chamber is measured using the thin film monitor, and based on the measured precipitation rate, the surface modification is initiated when the precipitation rate is less than a first pre-defined threshold, or interrupted if the precipitation rate rises above a second pre-defined threshold.
    Type: Application
    Filed: October 18, 2017
    Publication date: April 26, 2018
    Applicant: FEI Company
    Inventors: John Mitchels, Tomás Vystavêl, Martin Cafourek
  • Publication number: 20170345627
    Abstract: A charged-particle microscope, comprising a vacuum chamber in which are provided: A specimen holder for holding a specimen in an irradiation position; A particle-optical column, for producing a charged particle beam and directing it so as to irradiate the specimen; A detector, for detecting a flux of radiation emanating from the specimen in response to irradiation by said beam, wherein: Said vacuum chamber comprises an in situ magnetron sputter deposition module, comprising a magnetron sputter source for producing a vapor stream of target material; A stage is configured to move a sample comprising at least part of said specimen between said irradiation position and a separate deposition position at said deposition module; Said deposition module is configured to deposit a layer of said target material onto said sample when held at said deposition position.
    Type: Application
    Filed: June 1, 2016
    Publication date: November 30, 2017
    Applicant: FEI Company
    Inventors: John Mitchels, Rudolf Johannes Peter Gerardus Schampers, Michal Hrouzek, Tomas Gardelka