Abstract: A used PVD component refurbishing method includes providing a used PVD component, such as a RF coil (120), having a layer deposited on a component surface and first etching the deposited layer using a first acid-comprising etchant. After the first etching, the method includes entraining abrasive particles in a flow of gas, impinging the particles on the etched layer, and abrading the etched layer. After the abrading, the method includes second etching the abraded layer using a second acid-comprising etchant.

Abstract: A coil assembly (200) is described herein that comprises a) at least one coil (220) with a width (240); and b) at least one boss (210) coupled to the at least one coil, wherein the at least one boss comprises at least two support sections. Methods of forming and/or producing coil assemblies are described herein and comprise a) providing a coil; b) providing at least one boss having at least two support sections; and c) coupling the at least one boss to the coil.

Abstract: The invention includes coil constructions configured for utilization in PVD chambers, and also includes methods of forming coil constructions suitable for utilization in PVD chambers. The coil constructions can include one or more cup projections extending from an outer periphery of a coil body. The cup projections are one-piece with the coil body, and have a recess extending therein with a projecting lip extending entirely around the recess. The cup projections further comprise a fastener receiver within the recess configured to receive a fastener for connecting the coil with the chamber. The methods of forming the coil construction can include identifying separate components of an assembly associated with a coil replacement kit, and forming a one-piece construction which can be substituted for at least two of the components.

Abstract: The invention includes a coil support assembly having an insulator interfacing a surface of a shield disposed within a processing chamber. The insulator has an extension which extends through the shield. A second insulator is disposed between the shield and a coil and contacts a protrusion extending from the coil. A fastener is disposed through the first insulator and extends through the second insulator and into the protrusion. The fastener is electrically isolated from the shield by the first insulator. The invention includes coil assemblies containing the described coil support configuration. The invention further includes a method of supporting a coil within a processing chamber having a shield disposed therein. Insulators are inserted to extend from an outer side of the shield through a thickness of the shield. A coil is mounted within the chamber by inserting fasteners through each insulator into bosses which-protrude outwardly from the coil body.