Patents by Inventor John Mohn

John Mohn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Center gas feed apparatus for a high density plasma reactor
    Patent number: 6027606
    Abstract: The invention is embodied by a plasma reactor for processing a workpiece, including a reactor enclosure defining a processing chamber, a semiconductor ceiling window, a base within the chamber for supporting the workpiece during processing thereof, the semiconductor ceiling including a gas inlet system for admitting a plasma precursor gas into the chamber through the ceiling, and apparatus for coupling plasma source power into the chamber.
    Type: Grant
    Filed: June 30, 1998
    Date of Patent: February 22, 2000
    Assignee: Applied Materials, Inc.
    Inventors: John Mohn, Mei Chang, Raymond Hung, Kenneth Collins, Ru-Liang Julian Lee