Patents by Inventor John Nagata

John Nagata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6864190
    Abstract: Disclosed is a process for fabricating luminescent porous material, the process comprising pre-treating a substrate (e.g. crystalline silicon) with laser radiation (e.g from a Nd:YAG laser) in a predetermined pattern followed by exposing the irradiated substrate to a chemical stain etchant (e.g. HF:HNO3:H2O) to produce a luminescent nanoporous material. Luminescent porous material having a luminescence maximum greater than about 2100 meV may be produced by this method. Such nanoporous materials are useful in optoelectronic and other semiconductor devices.
    Type: Grant
    Filed: October 17, 2002
    Date of Patent: March 8, 2005
    Assignee: National Research Council of Canada
    Inventors: Yujie Han, Suwas Nikumb, Ben Li Luan, John Nagata
  • Publication number: 20040076813
    Abstract: Disclosed is a process for fabricating luminescent porous material, the process comprising pre-treating a substrate (e.g. crystalline silicon) with laser radiation (e.g from a Nd:YAG laser) in a predetermined pattern followed by exposing the irradiated substrate to a chemical stain etchant (e.g. HF:HNO3:H2O) to produce a luminescent nanoporous material. Luminescent porous material having a luminescence maximum greater than about 2100 meV may be produced by this method. Such nanoporous materials are useful in optoelectronic and other semiconductor devices.
    Type: Application
    Filed: October 17, 2002
    Publication date: April 22, 2004
    Applicant: NATIONAL RESEARCH COUNCIL OF CANADA
    Inventors: Yujie Han, Suwas Krishna Nikumb, Ben Li Luan, John Nagata