Patents by Inventor John P. Hatfield

John P. Hatfield has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist compositions
    Patent number: 6911297
    Abstract: Radiation sensitive compositions for use in producing a patterned image on a substrate comprise: a) a first photoacid generator compound which comprises one or more compounds of the structure (A); b) a second photoacid generator compound which comprises one or more compounds of the structure (B); c) a polymer component comprising an alkali soluble resin component whose alkali solubility is suppressed by the presence of acid sensitive moieties and whose alkali solubility is returned by treatment with an acid and, optionally, heat; wherein said polymer comprises one or more polymers comprising the monomer unit (C); ?and d) a solvent.
    Type: Grant
    Filed: June 19, 2003
    Date of Patent: June 28, 2005
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: David Brzozowy, J. Thomas Kocab, John P. Hatfield, Lawerence Ferreira, Andrew Blakeney
  • Photoacid generators for use in photoresist compositions
    Patent number: 6855476
    Abstract: A photoacid compound having the following general structure: R—O(CF2)nSO3X wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q— wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.
    Type: Grant
    Filed: April 5, 2002
    Date of Patent: February 15, 2005
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Lawrence Ferreira, Andrew J. Blakeney, Gregory Dominic Spaziano, Ognian Dimov, J. Thomas Kocab, John P. Hatfield
  • Photoresist compositions
    Publication number: 20040072095
    Abstract: Radiation sensitive compositions for use in producing a patterned image on a substrate comprise:
    Type: Application
    Filed: June 19, 2003
    Publication date: April 15, 2004
    Applicant: Arch Speciality Chemical, Inc.
    Inventors: David Brzozowy, Kocab J. Thomas, John P. Hatfield, Lawrence Ferreira, Andrew Blakeney
  • Photoacid generators for use in photoresist compositions
    Publication number: 20020197558
    Abstract: A photoacid compound having the following general structure:
    Type: Application
    Filed: April 5, 2002
    Publication date: December 26, 2002
    Applicant: ARCH SPECIALTY CHEMICALS, INC.
    Inventors: Lawrence Ferreira, Andrew J. Blakeney, Gregory Dominic Spaziano, Ognian Dimov, J. Thomas Kocab, John P. Hatfield