Patents by Inventor John P. Kettley, Jr.

John P. Kettley, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for etch processing with end point detection thereof
    Patent number: 7329328
    Abstract: A method for performing process end point detection in a semiconductor substrate processing system by monitoring for an increase in a flow of backside gas above a predetermined limit.
    Type: Grant
    Filed: December 10, 2004
    Date of Patent: February 12, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Aaron D. Gustafson, Daniel J. Baer, Leonard D. Moravek, John P. Kettley, Jr.
  • Method and apparatus for etch processing with end point detection thereof
    Patent number: 6837965
    Abstract: A method and apparatus performing process end point detection in a semiconductor substrate processing system by monitoring for an increase in a flow of backside gas above a predetermined limit.
    Type: Grant
    Filed: August 14, 2002
    Date of Patent: January 4, 2005
    Inventors: Aaron D. Gustafson, Daniel J. Baer, Leonard D. Moravek, John P. Kettley, Jr.