Patents by Inventor John P. Quitter

John P. Quitter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Laser discharge chamber passivation by plasma
    Patent number: 6914927
    Abstract: Methods and apparatus are provided for cleaning and passivating laser discharge chambers with plasmas. In one embodiment, an oxygen based plasma is formed in a plasma source external to the laser discharge chamber by applying a radiofrequency signal to oxygen containing gases. The oxygen based plasma is drawn into the laser discharge chamber, where it reacts with contaminants and cleans internal surfaces. After cleaning, a fluorine based plasma is formed in the plasma source and drawn into the laser discharge chamber to passivate internal surfaces. In another embodiment, cleaning with the oxygen based plasma is not used since some level of cleaning is accomplished with the fluorine based plasma. In another embodiment, oxygen based plasmas and fluorine based plasmas are formed in the laser discharge chamber by applying a radiofrequency signal to a laser discharge chamber electrode.
    Type: Grant
    Filed: August 26, 2003
    Date of Patent: July 5, 2005
    Assignee: Cymer, Inc.
    Inventors: Tom A. Watson, Richard L. Sandstrom, Richard G. Morton, Robert E. Weeks, John P. Quitter, Mark R. Lewis
  • Laser discharge chamber passivation by plasma
    Publication number: 20040037339
    Abstract: Methods and apparatus are provided for cleaning and passivating laser discharge chambers with plasmas. In one embodiment, an oxygen based plasma is formed in a plasma source external to the laser discharge chamber by applying a radiofrequency signal to oxygen containing gases. The oxygen based plasma is drawn into the laser discharge chamber, where it reacts with contaminants and cleans internal surfaces. After cleaning, a fluorine based plasma is formed in the plasma source and drawn into the laser discharge chamber to passivate internal surfaces. In another embodiment, cleaning with the oxygen based plasma is not used since some level of cleaning is accomplished with the fluorine based plasma. In another embodiment, oxygen based plasmas and fluorine based plasmas are formed in the laser discharge chamber by applying a radiofrequency signal to a laser discharge chamber electrode.
    Type: Application
    Filed: August 26, 2003
    Publication date: February 26, 2004
    Inventors: Tom A. Watson, Richard L. Sandstrom, Richard G. Morton, Robert E. Weeks, John P. Quitter, Mark A. Lewis
  • Laser discharge chamber passivation by plasma
    Patent number: 6644324
    Abstract: Methods and apparatus are provided for cleaning and passivating laser discharge chambers with plasmas. In one embodiment, an oxygen based plasma is formed in a plasma source external to the laser discharge chamber by applying a radiofrequency signal to oxygen containing gases. The oxygen based plasma is drawn into the laser discharge chamber, where it reacts with contaminants and cleans internal surfaces. After cleaning, a fluorine based plasma is formed in the plasma source and drawn into the laser discharge chamber to passivate internal surfaces. In another embodiment, cleaning with the oxygen based plasma is not used since some level of cleaning is accomplished with the fluorine based plasma. In another embodiment, oxygen based plasmas and fluorine based plasmas are formed in the laser discharge chamber by applying a radiofrequency signal to a laser discharge chamber electrode.
    Type: Grant
    Filed: March 6, 2000
    Date of Patent: November 11, 2003
    Assignee: Cymer, Inc.
    Inventors: Tom A. Watson, Richard L. Sandstrom, Richard G. Morton, Robert E. Weeks, John P. Quitter, Mark R. Lewis