Patents by Inventor John P. Wallace

John P. Wallace has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9176550
    Abstract: An apparatus may comprise a power management system. Other embodiments are described and claimed.
    Type: Grant
    Filed: December 23, 2010
    Date of Patent: November 3, 2015
    Assignee: INTEL CORPORATION
    Inventors: Biswajit Sur, Eric Distefano, James G. Hermerding, II, Eugene P. Matter, John P. Wallace, Guy M. Therien
  • Patent number: 8903464
    Abstract: An apparatus and process for the production of a niobium cavity exhibiting high quality factors at high gradients is provided. The apparatus comprises a first chamber positioned within a second chamber, an RF generator and vacuum pumping systems. The process comprises placing the niobium cavity in a first chamber of the apparatus; thermally treating the cavity by high temperature in the first chamber while maintaining high vacuum in the first and second chambers; and applying a passivating thin film layer to a surface of the cavity in the presence of a gaseous mixture and an RF field. Further a niobium cavity exhibiting high quality factors at high gradients produced by the method of the invention is provided.
    Type: Grant
    Filed: October 23, 2010
    Date of Patent: December 2, 2014
    Assignee: Jefferson Science Associates, LLC
    Inventors: Ganapati Rao Myneni, John P. Wallace
  • Publication number: 20120166842
    Abstract: An apparatus may comprise a power management system. Other embodiments are described and claimed.
    Type: Application
    Filed: December 23, 2010
    Publication date: June 28, 2012
    Inventors: Biswajit Sur, Eric Distefano, James G. Hermerding, II, Eugene P. Matter, John P. Wallace, Guy M. Therien
  • Patent number: 5675403
    Abstract: An imaging mount and apparatus that reduces or eliminates stress induced in an imaging mask mounted thereto. The mount comprises a support block and a trio of mounting pads connected thereto. At least two of the mounting pads are connected to the support block so that their respective positions are adjustable within a predetermined plane which is preferably substantially parallel to a surface of a substrate to be imaged. Each of the mounting pads including means for securing the imaging mask generally parallel to the predetermined plane. The positions the adjustable mounting pads adjust within the predetermined plane responsive to securing of the lithography mask thereto so that the imaging mask is essentially undeflected due to the securing thereof. The absence of deformation (and, as a result, stress) in the imaging mask due to its being secured to the mount reduces the degree of distortion of radiation passing through the mask and to the imprinted surface.
    Type: Grant
    Filed: May 28, 1996
    Date of Patent: October 7, 1997
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Franco Cerrina, John P. Wallace
  • Patent number: 5536559
    Abstract: An imaging mount and apparatus that reduces or eliminates stress induced in an imaging mask mounted thereto. The mount comprises a support block and a trio of mounting pads connected thereto. At least two of the mounting pads are connected to the support block so that their respective positions are adjustable within a predetermined plane which is preferably substantially parallel to a surface of a substrate to be imaged. Each of the mounting pads including means for securing the imaging mask generally parallel to the predetermined plane. The positions the adjustable mounting pads adjust within the predetermined plane responsive to securing of the lithography mask thereto so that the imaging mask is essentially undeflected due to the securing thereof. The absence of deformation (and, as a result, stress) in the imaging mask due to its being secured to the mount reduces the degree of distortion of radiation passing through the mask and to the imprinted surface.
    Type: Grant
    Filed: November 22, 1994
    Date of Patent: July 16, 1996
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Franco Cerrina, John P. Wallace
  • Patent number: H135
    Abstract: An electromagnetic levitation casting apparatus having an improved levitation coil assembly employing flux concentration devices, is provided. The improved levitation coil assembly comprises a plurality of slotted annular slugs surrounding a tubular casting vessel within which a liquid metal column is to be levitated and solidified by cooling pursuant to the General Electric Levitation Casting (GELEC (.RTM.)) process. Each of the slotted annular slugs is inductively coupled to a respective electromagnetic field producing coil having a large number of turns surrounding the slug. Each slotted annular slug serves to concentrate the magnetic field produced by its associated primary mutli-turn coil to substantially the interior cross sectional area of the tubular casting vessel it surrounds and functions as a current step-up transformer.
    Type: Grant
    Filed: June 19, 1984
    Date of Patent: September 2, 1986
    Inventors: John P. Wallace, Hugh R. Lowry
  • Patent number: RE49948
    Abstract: The present disclosure relates to HIF-2? inhibitors and methods of making and using them for treating cancer. Certain compounds were potent in HIF-2? scintillation proximity assay, luciferase assay, and VEGF ELISA assay, and led to tumor size reduction and regression in 786-O xenograft bearing mice in vivo.
    Type: Grant
    Filed: February 3, 2022
    Date of Patent: April 30, 2024
    Assignee: Peloton Therapeutics, Inc.
    Inventors: Darryl David Dixon, Jonas Grina, John A. Josey, James P. Rizzi, Stephen T. Schlachter, Eli M. Wallace, Bin Wang, Paul Wehn, Rui Xu, Hanbiao Yang