Abstract: A latching mechanism configured to fasten a hood panel to a vehicle body for covering a vehicle under-hood compartment includes a fork bolt positionable between a first position and at least one second position having a channel configured to capture the striker. A device releasably engages the fork bolt to adjust the fork bolt from the first position to the second position. A latch is positionable between at least the second position and a third position and includes a body including a primary catch portion and a secondary catch portion configured to releasably engage the striker in the second position. An actuator cooperates with the device and includes a projection configured to engage a portion of the latch body to adjust the latch from the second position to the third position. The secondary catch portion releases the striker in the third position.

Abstract: A latching mechanism configured to fasten a hood panel to a vehicle body for covering a vehicle under-hood compartment includes a fork bolt positionable between a first position and at least one second position having a channel configured to capture the striker. A device releasably engages the fork bolt to adjust the fork bolt from the first position to the second position. A latch is positionable between at least the second position and a third position and includes a body including a primary catch portion and a secondary catch portion configured to releasably engage the striker in the second position. An actuator cooperates with the device and includes a projection configured to engage a portion of the latch body to adjust the latch from the second position to the third position. The secondary catch portion releases the striker in the third position.

Abstract: A method is provided for performing photolithography on a substrate which has a first region on a lower level and a second region on an upper level, wherein a first pattern area exists within said first region, a second pattern area exists within said second region, and at least said first and second regions are coated with a photoresist, the method comprising: a) exposing the photoresist through a first mask so as to expose said first region including said first pattern area, and thus create a first pattern in said first pattern area, but not expose said second pattern area; and b) exposing the photoresist through a second mask so as to expose said second pattern area, and thus create a second pattern in said second pattern area, but not expose said first pattern area, and also to expose an area of said first region which lies adjacent said second region.

Abstract: A method is provided for performing photolithography on a substrate which has a first region on a lower level and a second region on an upper level, wherein a first pattern area exists within said first region, a second pattern area exists within said second region, and at least said first and second regions are coated with a photoresist, the method comprising: a) exposing the photoresist through a first mask so as to expose said first region including said first pattern area, and thus create a first pattern in said first pattern area, but not expose said second pattern area; and b) exposing the photoresist through a second mask so as to expose said second pattern area, and thus create a second pattern in said second pattern area, but not expose said first pattern area, and also to expose an area of said first region which lies adjacent said second region.

Abstract: A method is provided for performing photolithography on a substrate which has a first region on a lower level and a second region on an upper level, wherein a first pattern area exists within said first region, a second pattern area exists within said second region, and at least said first and second regions are coated with a photoresist, the method comprising: a) exposing the photoresist through a first mask so as to expose said first region including said first pattern area, and thus create a first pattern in said first pattern area, but not expose said second pattern area; and b) exposing the photoresist through a second mask so as to expose said second pattern area, and thus create a second pattern in said second pattern area, but not expose said first pattern area, and also to expose an area of said first region which lies adjacent said second region.

Abstract: A reticle for use in the production, using photo-lithography, of a MEMS or IC device containing one or more contact or via holes, comprises one or more apertures corresponding to said holes, and arranged to define said holes during the photo-lithography process, the reticle being characterised in that said apertures are substantially circular in shape.

Abstract: A method of coating contact holes in MEMS and micro-machining applications comprises:

Abstract: A method of removing exposed resist, including the steps of applying a first layer of developer to the surface of the resist for a first period of time, substantially removing said first layer of developer from the surface of the resist, and applying a second layer of developer to the surface of the resist for a second period of time. The method further includes the step of substantially removing said second layer of developer, and applying at least a third layer of developer to the surface of the resist for a third period of time.

Abstract: A method is provided for performing photolithography on a substrate which has a first region on a lower level and a second region on an upper level, wherein a first pattern area exists within said first region, a second pattern area exists within said second region, and at least said first and second regions are coated with a photoresist, the method comprising:

Abstract: A method and apparatus for converting a conventional mechanical or hydraulic system for driving the infeed and outfeed rolls of a planer mill or a similar conveyor to variable frequency electric power. The method involves disconnecting the roller shafts from pre-existing mechanical and hydraulic drive components housed within the conveyor gearbox or other support frame. The electric motors are mounted at fixed positions on a panel rigidly connected to the gearbox or other support frame at a location spaced-apart from the roller shafts. Each motor is coupled to a corresponding roller shaft by means of a connector drive shaft having universal joint couplers at each end thereof. This arrangement permits displacement of the roller shafts during normal operation of the conveyor without transferring torque forces to the electric motors. The speed of each motor and hence each roller may be independently controlled by a frequency inverter which is operable by remote control.

Abstract: An easy entry seat adjuster includes upper and lower track members which are slidable relative to each other. A latch carrier is slidably mounted on both track members and mounts a latch member having latch arms engageable within an opening of the upper track member and any one of a series of openings in the lower track member. Manual movement of the latch member out of engagement with an opening of the lower track member permits horizontal adjustment of the seat as the latch member carrier and upper track member move relative to the lower track member. Movement of the latch member out of engagement with the opening of the upper track member by a seat back actuated cam on the upper track member permits displacement of the upper track member between a horizontally adjusted position and easy entry position.