Abstract: Stable, aqueous solutions of chlorine dioxide and methods for producing stable, aqueous solutions of chlorine dioxide are disclosed. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 1000 ppm by weight or less of total impurities and/or 10 ppm or less of manganese and iron combined. The aqueous chlorine dioxide solutions are storage stable for at least 90 days at 25° C. and maintain at least 75% of the initial chlorine dioxide concentration. Methods of preparing, using and transporting the chlorine dioxide solutions are also disclosed.

Abstract: New methods are disclosed for decontaminating surfaces and enclosures that avoid problems such as salt deposits, corrosion and condensation that accompany the use of known methods. The methods involve the use of chlorine dioxide solutions prepared by passing dilute chlorine gas over solid granular sodium chlorite to produce chlorine dioxide gas which is then collected to form a solution with very low levels of impurities. The chlorine dioxide gas can be introduced into an enclosure and used to disinfect a portion of the contents of the enclosure.

Abstract: Stable, aqueous solutions of chlorine dioxide and methods for producing stable, aqueous solutions of chlorine dioxide are disclosed. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 1000 ppm by weight or less of total impurities and/or 10 ppm or less of manganese and iron combined. The aqueous chlorine dioxide solutions are storage stable for at least 90 days at 25° C. and maintain at least 75% of the initial chlorine dioxide concentration. Methods of preparing, using and transporting the chlorine dioxide solutions are also disclosed.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepared by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chloride and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepared by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chlorite and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepared by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chloride and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chlorite and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chlorite and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chlorite and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chlorite and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chloride and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chloride and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chloride and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: The present invention is for extremely pure solutions of chlorine dioxide, methods for making such solutions and to compositions and methods for storing, shipping and using such solutions. Generally, the chlorine dioxide solutions of the invention are aqueous solutions containing about 2500 ppm or less of total impurities. The chlorine dioxide solution can be prepare by passing dilute highly pure chlorine gas through a bed of substantially solid sodium chloride and contacting the resulting chlorine dioxide gas with a liquid.

Abstract: New compositions and methods are disclosed for decontaminating surfaces and enclosures that avoid problems such as salt deposits, corrosion and condensation that accompany the use of known methods. The process involves the use of chlorine dioxide solutions prepared by passing dilute chlorine gas over solid granular sodium chlorite to produce chlorine dioxide gas which is then collected in solution. The chlorine dioxide gas can be introduced into an enclosure and used to disinfect a portion of the contents of the enclosure.

Abstract: A process for cleaning a deposit from an interior surface of a processing chamber includes generating a plasma from a cleaning gas including SO2F2 and contacting the interior surface with the plasma for a time sufficient to convert the deposit into a volatile product, thereby cleaning the deposit from the interior surface, in which the process is conducted in the absence of SF6. The deposits, which may be removed by the process of the invention, include silicone, silicone oxide, silicone nitride, tungsten, copper and aluminum.

Abstract: A process for cleaning a deposit from an interior surface of a processing chamber includes generating a plasma from a cleaning gas including SO2F2 and contacting the interior surface with the plasma for a time sufficient to convert the deposit into a volatile product, thereby cleaning the deposit from the interior surface, in which the process is conducted in the absence of SF6. The deposits, which may be removed by the process of the invention, include silicone, silicone oxide, silicone nitride, tungsten, copper and aluminum.

Abstract: An improved method of processing both primary and secondary nonferrous metal and alloys of said metals using a refining gas is provided. The improvement involves refining said non-ferrous metal and alloys with a gaseous mixture including at least one compound selected from the group consisting of ClF3, ClF, COF2, F3COF, CF2(OF)2, SO2F2, NF3, SO2ClF, SOF2, SOF4, NOF, F2 and SF4.

Abstract: An improved method of processing a nonferrous metal and alloys of said metal using a blanketing gas having a global warming potential is provided. The improvement involves reducing the global warming potential of the blanketing gas by blanketing the nonferrous metal and alloys with a gaseous mixture including at least one compound selected from the group consisting of COF2, CF3COF, (CF3)2CO, F3COF, F2C(OF)2, SO2F2, NF3, SO2ClF, SOF2, SOF4, NOF, F2 and SF4.

Abstract: An improved method of processing both primary and secondary nonferrous metal and alloys of said metals using a refining gas having a global warming potential is provided. The improvement involves reducing said global warming potential of said refining gas by refining said non-ferrous metal and alloys with a gaseous mixture including at least one compound selected from the group consisting of ClF3, ClF, COF2, F3COF, CF2(OF)2, SO2F2, NF3, SO2ClF, SOF2, SOF4, NOF, F2 and SF4.