Abstract: A vaporizer generating feed gas for the arc chamber of an ion source has a crucible which is heated to a temperature at which material in the crucible sublimes to produce a vapour for use as the feed gas. In addition to the heating element for heating the crucible, there is a cooling element in the form of a cooling duct extending along the length of the crucible for receiving the cooling fluid. Forced cooling of the crucible when the heating element is switched off enables the crucible to be cooled more quickly so that the supply of a feed gas can be terminated sooner. This is important if an ion source is being switched from one feed gas to another. Also, the crucible may be forced cooled simultaneously while energizing the heating element to enable the crucible to be accurately controlled at a lower operating temperature if desired.

Abstract: A vaporiser generating feed gas for the arc chamber of an ion source has a crucible which is heated to a temperature at which material in the crucible sublimes to produce a vapour for use as the feed gas. In addition to the heating element for heating the crucible, there is a cooling element in the form of a cooling duct extending along the length of the crucible for receiving the cooling fluid. Forced cooling of the crucible when the heating element is switched off enables the crucible to be cooled more quickly so that the supply of a feed gas can be terminated sooner. This is important if an ion source is being switched from one feed gas to another. Also, the crucible may be forced cooled simultaneously while energising the heating element to enable the crucible to be accurately controlled at a lower operating temperature if desired.

Abstract: A vaporiser generating feed gas for the arc chamber of an ion source has a crucible which is heated to a temperature at which material in the crucible sublimes to produce a vapor for use as the feed gas. In addition to the heating element for heating the crucible, there is a cooling element in the form of a cooling duct extending along the length of the crucible for receiving the cooling fluid. Forced cooling of the crucible when the heating element is switched off enables the crucible to be cooled more quickly so that the supply of a feed gas can be terminated sooner. This is important if an ion source is being switched from one feed gas to another. Also, the crucible may be forced cooled simultaneously while energising the heating element to enable the crucible to be accurately controlled at a lower operating temperature if desired.

Abstract: Ion implantation equipment is modified so as to provide filament reflectors to a filament inside of an arc chamber, and to remove the electrical insulators for the filament outside of the arc chamber and providing a means of shielding, thereby reducing the formation of a conductive layer on said insulators and greatly extending the lifetime and reducing downtime of the equipment. The efficiency of the equipment is further enhanced by means of an interchangeable liner for the arc chamber that increases the wall temperature of the arc chamber and thus the electron temperature. The use of tungsten parts inside the arc chamber, obtained either by making the arc chamber itself or portions thereof of tungsten, particularly the front plate having the exit aperture for the ion beam, or by inserting a removable tungsten liner therein, decreases contamination of the ion beam. Serviceability of the arc chamber is improved by means of a unitary clamp that separately grips both the filament and filament reflectors.

Abstract: Ion implantation equipment is modified so as to provide filament reflectors to a filament inside of an arc chamber, and to remove the electrical insulators for the filament outside of the arc chamber and providing a shield, thereby reducing the formation of a conductive layer on said insulators and greatly extending the lifetime and reducing downtime of the equipment. The efficiency of the equipment is further enhanced by an interchangeable liner for the arc chamber that increases the wall temperature of the arc chamber and thus the electron temperature. The use of tungsten parts inside the arc chamber, obtained either by making the arc chamber itself or portions thereof of tungsten, particularly the front plate having the exit aperture for the ion beam, or by inserting a removable tungsten liner therein, decreases contamination of the ion beam. Serviceability of the arc chamber is improved by using a unitary clamp that separately grips both the filament and filament reflectors.

Abstract: Ion implantation equipment is modified so as to provide filament reflectors to a filament inside of an arc chamber, and to remove the electrical insulators for the filament outside of the arc chamber and providing a means of shielding, thereby reducing the formation of a conductive layer on said insulators and greatly extending the lifetime and reducing downtime of the equipment. The efficiency of the equipment is further enhanced by means of an interchangeable liner for the arc chamber that increases the wall temperature of the arc chamber and thus the electron temperature. The use of tungsten parts inside the arc chamber, obtained either by making the arc chamber itself or portions thereof of tungsten, particularly the front plate having the exit aperture for the ion beam, or by inserting a removable tungsten liner therein, decreases contamination of the ion beam. Serviceability of the arc chamber is improved by means of a unitary clamp that separately grips both the filament and filament reflectors.

Abstract: Ion implantation equipment is modified so as to provide filament reflectors to a filament inside of an arc chamber, and to remove the electrical insulators for the filament outside of the arc chamber and providing a means of shielding, thereby reducing the formation of a conductive layer on said insulators and greatly extending the lifetime and reducing downtime of the equipment. The efficiency of the equipment is further enhanced by means of an interchangeable liner for the arc chamber that increases the wall temperature of the arc chamber and thus the electron temperature. The use of tungsten parts inside the arc chamber, obtained either by making the arc chamber itself or portions thereof of tungsten, particularly the front plate having the exit aperture for the ion beam, or by inserting a removable tungsten liner therein, decreases contamination of the ion beam. Serviceability of the arc chamber is improved by means of a unitary clamp that separately grips both the filament and filament reflectors.