Patents by Inventor John Provine

John Provine has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190027347
    Abstract: A small-gap device system, preferably including two or more electrodes and one or more spacers maintaining a gap between two or more of the electrodes. A spacer for a small-gap device system, preferably including a plurality of legs defining a mesh structure. A method of spacer and/or small-gap device fabrication, preferably including: defining lateral features, depositing spacer material, selectively removing spacer material, separating the spacer from a fabrication substrate, and/or assembling the small-gap device.
    Type: Application
    Filed: July 24, 2018
    Publication date: January 24, 2019
    Inventors: Jared William Schwede, Igor Bargatin, Samuel M. Nicaise, Chen Lin, John Provine
  • Publication number: 20180181484
    Abstract: A content variation experiment system for performing variation testing of web pages is disclosed. A content provider receives requests for a web page undergoing an experiment. The content provider determines a variation from a plurality of variations of the web page to provide to the user. The content provider makes the determination without sending a network request to an experiment definition system used to define the experiment thereby reducing network latency.
    Type: Application
    Filed: December 27, 2016
    Publication date: June 28, 2018
    Inventors: Vijay Jambu, John Provine, Rama Ranganath, Ali Abbas Rizvi
  • Publication number: 20180033724
    Abstract: A method of forming a composite dielectric material can be provided by performing a first deposition cycle to form a first dielectric material and performing a second deposition cycle to form a second dielectric material on the first dielectric material, wherein the first and second dielectric materials comprise different dielectric materials selected from a list consisting of a transition metal nitride, a transition metal oxide, a transition metal carbide, a transition metal silicide, a post-transition metal nitride, a post-transition metal oxide, a post-transition metal carbide, a post-transition metal silicide, a metalloid nitride, a metalloid oxide, and a metalloid carbide.
    Type: Application
    Filed: July 27, 2016
    Publication date: February 1, 2018
    Inventors: Kl-HYUN KIM, FRIEDRICH B. PRINZ, JINSUNG KANG, YOUNGDONG LEE, JOHN PROVINE, PETER SCHINDLER, STEPHEN P. WALCH, YONGMIN KIM, HYO JIN KIM
  • Patent number: 9881865
    Abstract: A method of forming a composite dielectric material can be provided by performing a first deposition cycle to form a first dielectric material and performing a second deposition cycle to form a second dielectric material on the first dielectric material, wherein the first and second dielectric materials comprise different dielectric materials selected from a list consisting of a transition metal nitride, a transition metal oxide, a transition metal carbide, a transition metal silicide, a post-transition metal nitride, a post-transition metal oxide, a post-transition metal carbide, a post-transition metal silicide, a metalloid nitride, a metalloid oxide, and a metalloid carbide.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: January 30, 2018
    Assignees: Samsung Electronics Co., Ltd., The Board of Trustees of the Leland Stanford Junior University
    Inventors: Ki-Hyun Kim, Friedrich B. Prinz, Jinsung Kang, Youngdong Lee, John Provine, Peter Schindler, Stephen P. Walch, Yongmin Kim, Hyo Jin Kim
  • Patent number: 9255328
    Abstract: A metamaterial includes a first continuous layer formed with a first material by atomic layer deposition (ALD), a first non-continuous layer formed with a second material by ALD on first upper surface portions of a first upper surface of the first continuous layer, and a second continuous layer formed with the first material by ALD on second upper surface portions of the first upper surface of the first continuous layer and on a second upper surface of the first non-continuous layer.
    Type: Grant
    Filed: March 7, 2014
    Date of Patent: February 9, 2016
    Assignee: Robert Bosch GmbH
    Inventors: Fabian Purkl, John Provine, Gary Yama, Ando Feyh, Gary O'Brien
  • Publication number: 20140272333
    Abstract: A metamaterial includes a first continuous layer formed with a first material by atomic layer deposition (ALD), a first non-continuous layer formed with a second material by ALD on first upper surface portions of a first upper surface of the first continuous layer, and a second continuous layer formed with the first material by ALD on second upper surface portions of the first upper surface of the first continuous layer and on a second upper surface of the first non-continuous layer.
    Type: Application
    Filed: March 7, 2014
    Publication date: September 18, 2014
    Applicant: Robert Bosch GmbH
    Inventors: Fabian Purkl, John Provine, Gary Yama, Ando Feyh, Gary O'Brien