Patents by Inventor John R. Conrad
John R. Conrad has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240133091Abstract: A nonwoven composite that has a dimension in a machine direction and a cross-machine direction is provided. The composite comprises a nonwoven facing positioned adjacent to an elastic film. The nonwoven facing contains a spunbond web that is formed by necking a base spunbond web. The base spunbond web includes a plurality of fibers generally oriented in the machine direction and exhibiting a machine direction tensile strength and cross-machine direction tensile strength. The ratio of the machine direction tensile strength to the cross-machine direction tensile strength is about 4:1 or more.Type: ApplicationFiled: December 22, 2023Publication date: April 25, 2024Inventors: John H. Conrad, James R. Fitts, JR.
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Patent number: 5988103Abstract: Uniform ion implantation and deposition onto cylindrical surfaces is achieved by placing a cylindrical electrode in coaxial and conformal relation to the target surface. For implantation and deposition of an inner bore surface the electrode is placed inside the target. For implantation and deposition on an outer cylindrical surface the electrode is placed around the outside of the target. A plasma is generated between the electrode and the target cylindrical surface. Applying a pulse of high voltage to the target causes ions from the plasma to be driven onto the cylindrical target surface. The plasma contained in the space between the target and the electrode is uniform, resulting in a uniform implantation or deposition of the target surface. Since the plasma is largely contained in the space between the target and the electrode, contamination of the vacuum chamber enclosing the target and electrodes by inadvertent ion deposition is reduced.Type: GrantFiled: January 6, 1997Date of Patent: November 23, 1999Assignee: Wisconsin Alumni Research FoundationInventors: Robert P. Fetherston, Muhammad M. Shamim, John R. Conrad
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Patent number: 5693376Abstract: Uniform ion implantation and deposition onto cylindrical surfaces is achieved by placing a cylindrical electrode in coaxial and conformal relation to the target surface. For implantation and deposition of an inner bore surface the electrode is placed inside the target. For implantation and deposition on an outer cylindrical surface the electrode is placed around the outside of the target. A plasma is generated between the electrode and the target cylindrical surface. Applying a pulse of high voltage to the target causes ions from the plasma to be driven onto the cylindrical target surface. The plasma contained in the space between the target and the electrode is uniform, resulting in a uniform implantation or deposition of the target surface. Since the plasma is largely contained in the space between the target and the electrode, contamination of the vacuum chamber enclosing the target and electrodes by inadvertent ion deposition is reduced.Type: GrantFiled: June 23, 1995Date of Patent: December 2, 1997Assignee: Wisconsin Alumni Research FoundationInventors: Robert P. Fetherston, Muhammad M. Shamim, John R. Conrad
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Patent number: 4764394Abstract: Ion implantation into surfaces of three-dimensional targets is achieved by forming an ionized plasma about the target within an enclosing chamber and applying a pulse of high voltage between the target and the conductive walls of the chamber. Ions from the plasma are driven into the target object surfaces from all sides simultaneously without the need for manipulation of the target object. Repetitive pulses of high voltage, typically 20 kilovolts or higher, causes the ions to be driven deeply into the target. The plasma may be formed of a neutral gas introduced into the evacuated chamber and ionized therein with ionizing radiation so that a constant source of plasma is provided which surrounds the target object during the implantation process. Significant increases in the surface hardness and wear characteristics of various materials are obtained with ion implantation in this manner.Type: GrantFiled: January 20, 1987Date of Patent: August 16, 1988Assignee: Wisconsin Alumni Research FoundationInventor: John R. Conrad
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Patent number: 4756728Abstract: A satellite pre-filter cabinet positions replaceable air filters in an area in which air polluting harmful industrial dusts, including friable asbestos and/or fumes and gases are present and must be removed. The satellite air filter cabinet is connected to negative air pressure devices and filters remotely situated as for example outside of the polluted area.Type: GrantFiled: August 19, 1987Date of Patent: July 12, 1988Assignee: William R. EckstromInventor: John R. Conrad
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Patent number: 4630530Abstract: A filtering unit for a bus, the unit comprising one outer housing of a size to fit between the row of seats in the bus and a forwardly facing wall of a bus lavatory behind the seats, the housing having air inlet and air outlet openings for communication with ducts opening in upper and lower portions of the lavatory. The housing comprises a main housing body with an interior horizontal passageway of consistent cross sectional shape extending parallel to the rear of the outer housing, the main housing body having a horizontally facing opening at the outer end thereof which is covered by a panel which is movable to expose said opening, and a drawer unit slidable into or removable from said passageway through said opening. The drawer contains at least an air filter for removing at least lavatory odor-causing gaseous and particle materials from the air stream passing therethrough and an air circulating fan and drive motor therefor.Type: GrantFiled: May 9, 1984Date of Patent: December 23, 1986Assignee: Travel-Aire, Inc.Inventors: William R. Eckstrom, John R. Conrad
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Patent number: 4208387Abstract: Sulfur dioxide is removed from waste gases such as stack gases by contacting the gas stream with free tertiary amines having basic strengths greater than about pK 5 to form a coordinate covalent complex of the amine and the sulfur dioxide. The sufficiently stable complex is than thermally regenerated to liberate the sulfur dioxide in one stream, to provide the residual gases in another stream, and to provide the regenerated tertiary amine for collection and reuse in a subsequent sulfur dioxide cleanup step. The coordinate covalent complex reacts with even very small concentrations of sulfur dioxide to effectively reduce the sulfur dioxide to detectable zero levels. The presence of carbon dioxide in waste gas streams does not interfere with the efficient cleanup because the selected tertiary amine does not react with the carbon dioxide.Type: GrantFiled: August 20, 1976Date of Patent: June 17, 1980Assignee: Institute of Gas TechnologyInventors: Donald L. Klass, John R. Conrad
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Patent number: 3994780Abstract: An improved anaerobic digestion of organic biomass by rupturing cells of microorganisms present in a digested biomass or untreated biomass fraction undergoing digestion to obtain a treated biomass fraction having liberated indigenous enzymes in place; and contacting such treated biomass fraction with an untreated biomass fraction so the combined fractions undergo improved anaerobic digestion. The cells in the untreated biomass portion are ruptured by conventional means such as sonication, and about equal volumes of the fractions are preferably combined under conditions of conventional anaerobic digestion.Type: GrantFiled: October 17, 1975Date of Patent: November 30, 1976Assignee: Institute of Gas TechnologyInventors: Donald L. Klass, Sambhunath Ghosh, John R. Conrad