Patents by Inventor John R. Delude

John R. Delude has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Benzanthrone polymerization gate in photopolymerizable compositions
    Patent number: 5543262
    Abstract: A light sensitive composition which is capable of photopolymerization which includes a photopolymerizable compound a free radical generating component and a benzanthrone or substituted benzanthrone which substantially prevents photopolymerization when the light sensitive composition is exposed to actinic radiation below a threshold amount but permits photopolymerization when the light sensitive composition is exposed to actinic radiation above a threshold amount. This achieves a gate effect which eliminates or decreases unwanted partial exposure in the nonimage areas and hence improves reproduction quality.
    Type: Grant
    Filed: February 24, 1995
    Date of Patent: August 6, 1996
    Assignee: International Paper Company
    Inventors: Maria T. Sypek, John R. Delude, Paul A. Perron