Patents by Inventor John Rentschler

John Rentschler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5330629
    Abstract: A manufacturing method which includes forming a metallic, aluminum-containing layer adherent to a surface of a body. The method includes the steps of depositing aluminum on the surface from an aluminum-containing vapor, and during the aluminum-depositing step, the further step of depositing arsenic, phosphorus, or antimony on the surface from the vapor.
    Type: Grant
    Filed: December 15, 1992
    Date of Patent: July 19, 1994
    Assignee: AT&T Bell Laboratories
    Inventors: John E. Cunningham, William Y. Jan, John A. Rentschler, Colin A. Warwick
  • Patent number: 5061150
    Abstract: An apparatus for single-handed operation in skidding logs, stumps, poles and the like. An A-frame with rearwardly-extending beam is attached to the three-point hitch of a tractor. A fluid-operated grapple, which will inherently adjust to various shapes and sizes of objects, is suspended from the rearward end of the beam. A chain, having a small amount of slack, is connected by its ends to the grapple tongs, and is rove around sleeved bolts near the draft arm attachment points. When the object to be skidded is grappled and lifted, the operator moves the tractor in the desired direction, and the chain immediately takes the towing load.
    Type: Grant
    Filed: March 31, 1989
    Date of Patent: October 29, 1991
    Inventor: John Rentschler
  • Patent number: 4239787
    Abstract: A semitransparent photolithography mask, i.e., one transparent to a portion of the visible light spectrum, is achieved by electron and ion bombardment of a positive photoresist. This bombardment is performed after the desired photoresist pattern is defined by the sequential steps of depositing, baking and developing the photoresist (14) on a light transparent substrate (15). In the preferred embodiment, the electron and ion bombardment is accomplished in a predominantly nitrogen atmosphere within a sputtering chamber using indium tin oxide as the sputtering target. As a result of the bombardment, the photoresist is converted into a material which is opaque to only the ultraviolet portion of the light spectrum.
    Type: Grant
    Filed: June 25, 1979
    Date of Patent: December 16, 1980
    Assignee: Bell Telephone Laboratories, Incorporated
    Inventor: John A. Rentschler