Abstract: The current application discloses novel zwitterion materials which provide unexpected results useful in photolithographic resist compositions. In particular the compounds and photoresists made therefrom provide improvements in EUV photo defined line geometries as well as increased lithographic photospeed. Also provided are resist compositions containing the disclosed novel zwitterions.

Abstract: The current application discloses zwitterion materials useful in EUV photolithographic resist compositions. The compositions provide improvements in photodefined line geometires as well as increased lithographic photospeed. Also provided are resist compositions containing the disclosed novel zwitterions.

Abstract: A system and method are provided for an internal combustion engine. An engine system, in one example, includes a cylinder liner positioned within an opening of a crankcase, including a surface biasing a landing surface of an undercut fillet of the crankcase, and including a cylinder opening and a seal arranged in a groove of the cylinder liner positioned axially above the undercut fillet. The engine system further includes a fluid gasket and a combustion gasket positioned between a cylinder head and the crankcase, the fluid gasket and the combustion gasket being decoupled from one another.

Abstract: Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative substituted with an amine and a crosslinking agent. The formulation is drain compatible with other solvents used in the semiconductor industry.

Abstract: The present disclosure relates to novel negative- working and novel positive-working photoresist compositions for high speed, fine line processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays. The novel photoresists contain specific metals components which are added to positive and negative photoresist compositions which are themselves composed of conventional photoresist materials.

Abstract: The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.

Abstract: The present disclosure relates to novel multiple trigger monomer containing negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions utilize novel monomers and mixtures of novel monomers. The methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

Abstract: A system and method are provided for an internal combustion engine. An engine system, in one example, includes a cylinder liner positioned within an opening of a crankcase, including a surface biasing a landing surface of an undercut fillet of the crankcase, and including a cylinder opening and a seal arranged in a groove of the cylinder liner positioned axially above the undercut fillet. The engine system further includes a fluid gasket and a combustion gasket positioned between a cylinder head and the crankcase, the fluid gasket and the combustion gasket being decoupled from one another.

Abstract: Methods and systems are provided for a battery supplying power to an exhaust oxygen sensor heater. In one example, a method may include estimating a power delivered to the heater during heating of the sensor and in response to a power delivered from a battery being lower than a threshold, adjusting a battery charging strategy prior to an immediately subsequent engine start.

Abstract: The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.

Abstract: Methods and systems are provided for a battery supplying power to an exhaust oxygen sensor heater. In one example, a method may include estimating a power delivered to the heater during heating of the sensor and in response to a power delivered from a battery being lower than a threshold, adjusting a battery charging strategy prior to an immediately subsequent engine start.

Abstract: A method of imparting compressive residual stress to a first plurality of balls includes a) placing the balls between a first body having a first surface and a second body having a second surface, the first surface including a smooth contact portion, the smooth contact portion being substantially flat or convex and having a surface hardness greater than or equal to an initial surface hardness of the balls, b) imparting a compressive stress along a first diameter of the balls by pressing the first body toward the second body or the second body toward the first body or the first and second bodies toward one another with a force, and c) causing relative movement between the first surface and the second surface while maintaining the force at or above a minimum level to impart the compressive stress along other diameters of the balls different than the first diameter.

Abstract: The present disclosure relates to novel multiple trigger monomer containing negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions utilize novel monomers and mixtures of novel monomers. The methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

Abstract: Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative substituted with an amine and a crosslinking agent. The formulation is drain compatible with other solvents used in the semiconductor industry.

Abstract: The present disclosure relates to novel positive and negative photoresist compositions containing components that are based on one or more specific metals, metal salts, and/or metal complexes and methods of using them. The photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays. The metals are characterized by high absorption cross sections and selected elastic and inelastic electron cross section.

Abstract: An apparatus for imparting compressive residual stress to at least a surface portion of a first plurality of balls includes a first body having a first surface, the first surface including a smooth contact portion, the smooth contact portion being substantially flat or convex and having a surface hardness greater than or equal to the initial surface hardness of the balls. The apparatus also includes a second body having a second surface, the first surface overlying the second surface, and at least one drive operably connected to the first body or to the second body and configured to move one of the first and second bodies relative to the other body at a substantially fixed distance, the at least one drive also being configured to move the first body toward the second body with a force or to move the second body toward the first body with the force.

Abstract: The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

Abstract: The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

Abstract: A process and apparatus for forming a sheet metal component using an electric current passing through the component. The process can include providing an incremental forming machine, the machine having at least one arcuate tipped tool and at least electrode spaced a predetermined distance from the arcuate tipped tool. The machine is operable to perform a plurality of incremental deformations on the sheet metal component using the arcuate tipped tool. The machine is also operable to apply an electric direct current through the electrode into the sheet metal component at the predetermined distance from the arcuate tipped tool while the machine is forming the sheet metal component.

Abstract: A removable cover system may include a first cover member and a second cover member joined by an adjustable pivot system that is adjustable to accommodate different seat/headrest and windshield positions across a diverse spectrum of car designs and models. A removable connection may secure the cover system to an automobile windshield and a seat back or headrest member. During use, the cover system provides a convenient shield from sun radiation and post use may be conveniently stored without rendering a permanent change to the automobile. The cover members of the system may be opaque, translucent, and/or transparent.