Abstract: A wafer position error detection and correction system determines the presence of a wafer on a wafer transport robot blade. The system also determines a wafer position error by monitoring the position of the wafer with respect to the blade with one sensor which is located proximate to each entrance of a process chamber. When a wafer position error is detected, the system determines the extent of the misalignment and corrects such misalignment if correctable by the wafer transport robot or alerts an operator for operator intervention. The system incorporates a transparent cover on the surface of the wafer handling chamber and four optical detection sensors disposed on the surface of the transparent cover, in which each sensor is placed proximate to the entrance of the process chamber. In addition, an I/O sensor is placed adjacent the I/O slit valve to detect and correct wafer position errors.

Abstract: A system and method for capturing data communicated between a computer system and a printer. The data capture system monitors data communicated between the computer system and printer, acquires pertinent portions of the data, and stores the acquired data for later use. This system and method may be used to acquire patient encounter data, including demographic and insurance data, entered into a medical provider's computer office management system when the patient visits the medical provider. Often, the medical provider will print patient encounter data at a printer connected to the office management system. The data capture system acquires and stores pertinent portions of the patient encounter data, such as the demographic data, communicated from the medical provider's office management system to the printer.

Abstract: A method for forming a spatial light modulator (SLM) comprises forming a substrate (10) underneath a layer of Ferro-Electric crystal material (14) with a plurality of mirrored elements (12) disposed on the surface thereof. The process involves forming a layer of low stress oxide on the surface of the substrate over control pads or conductive strips (24) which are connected to underlying control elements. Openings (30) are formed in the oxide, followed by a formation of a conformal layer of aluminum (32). This is etched to form plugs (36) and then the substrate is subjected to a chemical/mechanical planarization step. This involves polishing the substrate to provide an optically flat surface. Thereafter, a layer of aluminum is then disposed on the surface of the substrate, patterned and etched to form the mirrored elements (12).

Abstract: A pigment is formed in an aqueous slurry. A mixture of the pigmented slurry and a vehicle is subjected to high speed, high shear mixing action. The water is forced out of the solid pigment and replaced by the vehicle forming bead-like spherical conglomerates. The conglomerates grow into clusters in the dispersing phase during the mixing process. The clusters are filtered from the dispersing water phase forming a flushed pigment which is used for dispersion in ink systems.

Abstract: A pigment is formed in an aqueous slurry. A mixture of the pigmented slurry and a vehicle is subjected to high speed, high shear mixing action. The water is forced out of the solid pigment and replaced by the vehicle forming bead-like spherical conglomerates. The conglomerates grow into clusters in the dispersing phase during the mixing process. The clusters are filtered from the dispersing water phase forming a flushed pigment which is used for dispersion in ink systems.