Patents by Inventor John S. Graves, III

John S. Graves, III has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9679116
    Abstract: A processor based method for measuring dimensional properties of a photoresist profile by determining a number acid generators and quenchers within a photoresist volume, determining a number of photons absorbed by the photoresist volume, determining a number of the acid generators converted to acid, determining a number of acid and quencher reactions within the photoresist volume, calculating a development of the photoresist volume, producing with the processor a three-dimensional simulated scanning electron microscope image of the photoresist profile created by the development of the photoresist volume, and measuring the dimensional properties of the photoresist profile.
    Type: Grant
    Filed: August 28, 2013
    Date of Patent: June 13, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: John J. Biafore, Mark D. Smith, John S. Graves, III, David Blankenship
  • Publication number: 20140067346
    Abstract: A processor based method for measuring dimensional properties of a photoresist profile by determining a number acid generators and quenchers within a photoresist volume, determining a number of photons absorbed by the photoresist volume, determining a number of the acid generators converted to acid, determining a number of acid and quencher reactions within the photoresist volume, calculating a development of the photoresist volume, producing with the processor a three-dimensional simulated scanning electron microscope image of the photoresist profile created by the development of the photoresist volume, and measuring the dimensional properties of the photoresist profile.
    Type: Application
    Filed: August 28, 2013
    Publication date: March 6, 2014
    Applicant: KLA-Tencor Corporation
    Inventors: John J. Biafore, Mark D. Smith, John S. Graves, III, David Blankenship
  • Patent number: 8589827
    Abstract: A processor based method for measuring dimensional properties of a photoresist profile. A number acid generators and quenchers within a photoresist volume is determined. A number of photons absorbed by the photoresist volume is determined. A number of the acid generators converted to acid is determined. A number of acid and quencher reactions within the photoresist volume is determined. A development of the photoresist volume is calculated. The processor is used to produce a three-dimensional simulated scanning electron microscope image of the photoresist profile created by the development of the photoresist volume. The dimensional properties of the photoresist profile are measured.
    Type: Grant
    Filed: October 29, 2010
    Date of Patent: November 19, 2013
    Assignee: KLA-Tencor Corporation
    Inventors: John J. Biafore, Mark D. Smith, John S. Graves, III, David Blankenship
  • Publication number: 20110112809
    Abstract: A processor based method for measuring dimensional properties of a photoresist profile by determining a number acid generators and quenchers within a photoresist volume, determining a number of photons absorbed by the photoresist volume, determining a number of the acid generators converted to acid, determining a number of acid and quencher reactions within the photoresist volume, calculating a development of the photoresist volume, producing with the processor a three-dimensional simulated scanning electron microscope image of the photoresist profile created by the development of the photoresist volume, and measuring the dimensional properties of the photoresist profile.
    Type: Application
    Filed: October 29, 2010
    Publication date: May 12, 2011
    Applicant: KLA-TENCOR CORPORATION
    Inventors: John J. Biafore, Mark D. Smith, John S. Graves, III, David Blankenship