Abstract: A plasma source using a combination of concentric coils and ferromagnetic cores drives a radio frequency magnetic flux with controlled radial magnitude variation through a window into a reduced pressure process chamber, to provide improved plasma generation efficiency and ease of process uniformity adjustment.

Abstract: A plasma source using a combination of concentric coils and ferromagnetic cores drives a radio frequency magnetic flux with controlled radial magnitude variation through a window into a reduced pressure process chamber, to provide improved plasma generation efficiency and ease of process uniformity adjustment.

Abstract: A plasma generation system comprises a two-by-two or larger array of alternating magnetic poles set proximate to an insulating window in a chamber containing a process gas. The magnetic poles are ferromagnetic core coils driven by a radio frequency power source at sufficient energies to generate a plasma within the process gas chamber. The magnetic poles are included in ferromagnetic core coils that are wired to the radio frequency power source such that each magnetic pole is surrounded equally in the plane of the insulating window by adjacent magnetic poles of opposite magnetic polarity and uniform magnitudes. In a two-by-two array, the two sets of opposite corners have opposite magnetic polarities.

Abstract: An embodiment of the present invention is a plasma system that comprises a main coil with a flattened side and a capacitor in parallel that form a tuned circuit with radio frequency energy coupled to it through a radio frequency match by a generator. A process chamber with a quartz window and containing a low pressure gas is adjacent to the flat side of the main coil and a two-dimensional planar plasma in the shape of a circular disk is ignited and maintained by a high rate of change of the current flowing in the main coil. An electrode positioned in the chamber opposite to the window is used for attaching a semiconductor wafer for processing and a potential applied to the electrode independently controls the ion energy of ions attracted and accelerated out of the plasma.

Abstract: A high voltage probe comprises a standard high frequency coaxial cable terminated in its characteristic impedance through most of the high frequency range, and a circuit of resistors and capacitors that provide a fixed division ratio regardless of the input frequency.

Abstract: An apparatus for producing a planar plasma in a low pressure process gas includes a chamber and an external planar coil. Radiofrequency resonant current is induced in the planar coil which in turn produces a planar magnetic field within the exclosure. The magnetic field causes circulating flux of electrons which in turn produces a planar region of ionic and radical species. The system may be used for plasma treatment of a variety of planar articles, typically semiconductor wafers which are oriented parallel to the plasma within the enclosure.