Abstract: Diacrylates or dimethacrylates, which are compatible with water before exposure to actinic radiation but after such exposure form hard, insoluble, coatings which are resistant to organic solvents and to water, are made by reaction with (meth)acrylic acid, or with a dicarboxylic acid and a hydroxy group-containing (meth)acrylate, of epoxide groups in an advanced diepoxide resin containing groups of formula ##STR1## where R.sup.4 denotes a divalent (cyclo)aliphatic or araliphatic radical,each R.sup.15 denotes an alkyl group or each pair of R.sup.15 denotes a group of formula --CH.sub.2).sub.2 --, --C(R.sup.16 R.sup.17)CO--, --CH.sub.2 CH(CH.sub.3)--, --CH.sub.2 --.sub.3, or --CO--.sub.2, wherein R.sup.16 and R.sup.17 each represent a hydrogen atom, an alkyl group, or, conjointly, a cycloaliphatic ring, andc is zero or 1.

Abstract: A method for forming an image by a positive resist process comprises:(1) exposing imagewise to actinic radiation a photoresist composition comprising:(a) a film-forming organic material having at least one substituted benzoin group of formula: ##STR1## where R.sup.1 denotes a hydrogen atom, an alkyl, cycloalkyl, cycloalkylalkyl, or aralkyl group or a group --(CH.sub.2).sub.b X; R.sup.2 denotes a hydrogen atom or an alkyl, cycloalkyl, cycloalkylalkyl, aryl or aralkyl group; R.sup.3 denotes a halogen atom or an alkyl, alkoxy, cycloalkyl, cycloalkylalkyl or phenyl group; X denotes a halogen atom, an alkoxy group, a phenoxy group, a group --COOR.sup.4 or a group --OOCR.sup.4, where R.sup.

Abstract: The imidyl compounds, according to the invention, of the formula I are suitable for the manufacture of polymers which can be crosslinked by light, which polymers can be, for example, polyesters, polyamides, polyamide-imides, polyimides, polyester-polyamides, polyester-amide-imides, polyethers, polyamines, polysaccharides and polysiloxanes. Polymers of this type are suitable for carrying out photochemical processes. Compared with known polymers, the polymers based on the imidyl compounds according to the invention have the advantage that they are photochemically substantially more sensitive. In addition, this sensitivity can also be further increased effectively by a combination with sensitizers.

Abstract: The imidyl compounds, according to the invention, of the formula I are suitable for the manufacture of polymers which can be crosslinked by light, which polymers can be, for example, polyesters, polyamides, polyamide-imides, polyimides, polyester-polyamides, polyester-amide-imides, polyethers, polyamines, polysaccharides and polysiloxanes. Polymers of this type are suitable for carrying out photochemical processes. Compared with known polymers, the polymers based on the imidyl compounds according to the invention have the advantage that they are photochemically substantially more sensitive. In addition, this sensitivity can also be further increased effectively by a combination with sensitizers.

Abstract: The imidyl compounds, according to the invention, of the formula I are suitable for the manufacture of polymers which can be crosslinked by light, which polymers can be, for example, polyesters, polyamides, polyamide-imides, polyimides, polyester-polyamides, polyester-amide-imides, polyethers, polyamines, polysaccharides and polysiloxanes. Polymers of this type are suitable for carrying out photochemical processes. Compared with known polymers, the polymers based on the imidyl compounds according to the invention have the advantage that they are photochemically substantially more sensitive. In addition, this sensitivity can also be further increased effectively by a combination with sensitisers.

Abstract: The invention relates to organic polymers which can be crosslinked under the action of light and which are suitable for carrying out photomechanical processes. These polymers are photochemically considerably more sensitive than known comparable polymers and their sensitivity can additionally also be further increased by means of a combination with sensitizers. The molecular weight is at least 1,000. The polymers contain, as light-sensitive groups, groups of the formula I ##STR1## wherein R and R.sub.1 independently of one another denote alkyl groups with at most 4 C atoms, or R and R.sub.1 conjointly denote the remaining part of a 5-membered to 6-membered carbocyclic ring.

Abstract: The invention relates to organic polymers which can be crosslinked under the action of light and which are suitable for carrying out photomechanical processes. These polymers are photochemically considerably more sensitive than known comparable polymers and their sensitivity can additionally also be further increased by means of a combination with sensitisers. The molecular weight is at least 1,000. The polymers contain, as light-sensitive groups, groups of the formula I ##STR1## wherein R and R.sub.1 independently of one another denote alkyl groups with at most 4 C atoms, or R and R.sub.1 conjointly denote the remaining part of a 5-membered to 6-membered carbocyclic ring.

Abstract: The invention relates to organic polymers which can be crosslinked under the action of light and which are suitable for carrying out photomechanical processes. These polymers are photochemically considerably more sensitive than known comparable polymers and their sensitivity can additionally also be further increased by means of a combination with sensitizers. The molecular weight is at least 1,000. The polymers contain, as light-sensitive groups, groups of the formula I ##STR1## wherein R and R.sub.1 independently of one another denote alkyl groups with at most 4 C atoms, or R and R.sub.1 conjointly denote the remaining part of a 5-membered to 6-membered carbocyclic ring.

Abstract: Diepoxides which may be photopolymerized in the presence or absence of a photosensitizer contain a group having conjugated unsaturation attached to a nitrogen heterocycle, such as a hydantoin or barbituric acid residue, forming part of an advanced diepoxide. The resultant photopolymer may be crosslinked by heating in the presence of a curing agent for epoxide resins.The diepoxides are of use in the production of printing plates and printed circuits, especially multilayer printed circuits.