Abstract: Systems and methods for generating plasma to stimulate plant growth comprise a high voltage generation circuit comprising a mains power input, a high power mosfet and insulated-gate bipolar transistor, and a trigger circuit; and a plasma emitter plant applicator comprising an applicator body, a plasma applicator shield, and two plasma activator electrodes configured to generate an electric field therebetween.

Abstract: A system and method for plasma treatment comprises a radiofrequency chamber, a microwave source configured to provide energy to the radiofrequency chamber, a reaction chamber configured to accept a treatment flow, a plasma dispensation assembly configured in the reaction chamber, the plasma dispensation assembly being powered by energy from the radiofrequency chamber, and a collection chamber for collecting treated material from the reaction chamber. The systems and methods can be used for treatment of various treatment flows.