Patents by Inventor John Scott Hallock

John Scott Hallock has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240112484
    Abstract: A computer-implemented method for training an artificial intelligence based neural network is provided. At least one digital image of at least one security document is provided as a reference. A set of digital training images is provided, wherein these are altered compared to the digital image of the security document. The set of digital training images includes a first subset of positive digital training images having a visual impact of an alteration such that an unbiased human observer would consider a reproduction of the respective digital training image to represent the security document or multiple security documents. The set of digital training images includes a second subset of negative digital training images. Ground truth is provided to the neural network as to whether a reproduction of the respective digital training image is to be considered representing the security document or multiple security documents or not.
    Type: Application
    Filed: May 25, 2021
    Publication date: April 4, 2024
    Inventors: John Scott HALLOCK, Pascal BIGARE, Sylvain CHOSSON, Claudio BELLINI, Martin EICHENBERGER, Elisabeth SCHULZ
  • Patent number: 6524936
    Abstract: A process for stripping a photoresist layer after exposure to an ion implantation process. The process includes subjecting a substrate having the ion implanted photoresist layer thereon to a UV radiation exposure and subsequently removing the ion implanted photoresist by conventional stripping processes.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: February 25, 2003
    Assignee: Axcelis Technologies, Inc.
    Inventors: John Scott Hallock, Alan Frederick Becknell, Palani Sakthivel
  • Patent number: 6503693
    Abstract: A process for altering exposed and developed photoresist features. The photoresist features are exposed to at least one compound that will react with at least one of itself and at least one component of the photoresist. The reaction takes place in the presence of at least one component of the photoresist. The photoresist features are exposed to reaction-initiating energy during at least one time selected from the group consisting of prior to, simultaneous with and subsequent to exposing the photoresist features to the at least one compound.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: January 7, 2003
    Assignee: Axcelis Technologies, Inc.
    Inventors: Robert Douglas Mohondro, John Scott Hallock
  • Publication number: 20020151156
    Abstract: A process for stripping a photoresist layer after exposure to an ion implantation process. The process includes subjecting a substrate having the ion implanted photoresist layer thereon to a UV radiation exposure and subsequently removing the ion implanted photoresist by conventional stripping processes.
    Type: Application
    Filed: December 22, 2000
    Publication date: October 17, 2002
    Inventors: John Scott Hallock, Alan Frederick Becknell, Palani Sakthivel
  • Patent number: 6387461
    Abstract: A composition suitable for scavenging oxygen is disclosed which comprises a carrier having a combination of a hydroxosulfitometalate and a transition metal ion source.
    Type: Grant
    Filed: May 6, 1999
    Date of Patent: May 14, 2002
    Assignee: Cryovac, Inc.
    Inventors: Cynthia Louise Ebner, John Scott Hallock
  • Patent number: 6258883
    Abstract: An oxygen scavenging system and composition capable of providing good oxygen absorption activity and capabilities, wherein the system comprises a modified anionic hydrotalcite particulate material and a transition metal ion source.
    Type: Grant
    Filed: May 6, 1999
    Date of Patent: July 10, 2001
    Assignee: Cryovac, Inc.
    Inventors: Cynthia Louise Ebner, John Scott Hallock
  • Patent number: 6007885
    Abstract: An oxygen scavenging composition capable of providing good oxygen absorption capabilities wherein the oxygen scavenging agent is a hydroxosulfitometalate. Methods for making a hydroxosulfitometalate are also disclosed.
    Type: Grant
    Filed: March 19, 1998
    Date of Patent: December 28, 1999
    Assignee: W.R. Grace & Co.-Conn.
    Inventor: John Scott Hallock
  • Patent number: 5981147
    Abstract: Disclosed are waterborne, stable photoresist compositions and methods of their preparation and use. The compositions are characterized by increased shear and storage stability. The photoresist composition comprises an aqueous emulsion of a 22% or less neutralized carboxylated resin and non-ionic surfactant containing poly(ethylene-oxide) segments, photopolymerizable monomer and photoinitiator. Neutralization is accomplished using either an organic or an inorganic base or mixtures thereof. The photoresist compositions are useful to selectively coat and protect surfaces subjected to corrosive environments, e.g., etchant processes, in the production of circuit traces for electronic circuit boards.
    Type: Grant
    Filed: April 8, 1997
    Date of Patent: November 9, 1999
    Assignee: Mac Dermid Incorporated
    Inventors: John Scott Hallock, Alan Frederick Becknell, Cynthia Louise Ebner, Daniel Joseph Hart
  • Patent number: 5941037
    Abstract: An oxygen scavenging agent and compositions capable of providing good oxygen absorption capabilities which contain said agent, wherein the agent is a modified anionic hydrotalcite particulate material.
    Type: Grant
    Filed: November 21, 1997
    Date of Patent: August 24, 1999
    Assignee: W. R. Grace & Co.-Conn
    Inventors: John Scott Hallock, Drew Ve Speer
  • Patent number: 5869220
    Abstract: Highly versatile stable photoresist emulsions can be prepared using low levels of neutralization while minimizing the use of surfactants and associative thickeners. High solids, low viscosity waterborne photoresist emulsion compositions are prepared by mixing and comminuting a partially neutralized acid functional latex polymer resin with photopolymerizable monomers and photoinitiators under conditions sufficient to produce a stable emulsion.
    Type: Grant
    Filed: June 6, 1997
    Date of Patent: February 9, 1999
    Assignee: MacDermid Acumen, Inc.
    Inventors: John Scott Hallock, Hiroshi Samukawa