Abstract: The modified advanced epoxide resins described, having an average molecular weight of up to 50,000, can be photopolymerized without the need to include photosensitizers. They may be prepared by reaction of a diepoxide ##STR1## with a keto group-containing dihydric phenol ##STR2## to form the advanced epoxide resin ##STR3## followed by condensation with an aldehyde RCHO to yield ##STR4## In the above formulae, R is an organic group which preferably has ethylenic unsaturation or heterocyclic aromaticity in conjugation with the indicated ethylenic double bond; R.sup.1 is the divalent residue linking two epoxide groups; R.sup.2 is preferably a hydrogen atom but may be an organic group, halogen, or cyano; R.sup.3 is a trivalent aromatic or heterocyclic group, especially a group ##STR5## If desired, other dihydric phenols can be employed with that containing a keto group, and condensation with the aldehyde may be carried out so that only some groups --COCH.sub.2 R.sup.2 undergo reaction.

Abstract: The resins are diepoxides of the formula ##STR1## where A IS AN INTEGER OF AVERAGE VALUE FROM 1 TO 100,Each R and R.sup.1 represents a group ##STR2## OR --O--(OC).sub.c --R.sup.5 --(CO).sub.c --O--, each R.sup.2 represents --H or a group --(CH.sub.2 NH).sub.d COC(R.sup.6).dbd.CH.sub.2, at least one of the 2a groups R.sup.2 representing --(CH.sub.2 NH).sub.d COC(R.sup.6).dbd.CH.sub.2,each R.sup.3 denotes a lower alkyl group, or conjointly each pair represents a group of formula --CH.sub.2 CH.sub.2 --, --C(R.sup.7 R.sup.8)CO--, ##STR3## --CH.sub.2 CH.sub.2 CH.sub.2 --, --COCO--, --COCOCO--, or --COC(OH).sub.2 CO--,R.sup.4 represents a divalent aliphatic, cycloaliphatic, or araliphatic radical,b, c, and d are each zero or 1,R.sup.5 represents a straight or branched chain aliphatic group or, providing c is 1, it may alternatively represent a group ##STR4## R.sup.6 represents --H or a lower alkyl group, and R.sup.7 and R.sup.8 each represent --H, --CH.sub.3, or --C.sub.2 H.sub.5.

Abstract: The imidyl compounds, according to the invention, of the formula I are suitable for the manufacture of polymers which can be crosslinked by light, which polymers can be, for example, polyesters, polyamides, polyamide-imides, polyimides, polyester-polyamides, polyester-amide-imides, polyethers, polyamines, polysaccharides and polysiloxanes. Polymers of this type are suitable for carrying out photochemical processes. Compared with known polymers, the polymers based on the imidyl compounds according to the invention have the advantage that they are photochemically substantially more sensitive. In addition, this sensitivity can also be further increased effectively by a combination with sensitizers.

Abstract: The invention relates to organic polymers which can be crosslinked under the action of light and which are suitable for carrying out photomechanical processes. These polymers are photochemically considerably more sensitive than known comparable polymers and their sensitivity can additionally also be further increased by means of a combination with sensitizers. The molecular weight is at least 1,000. The polymers contain, as light-sensitive groups, groups of the formula I ##STR1## wherein R and R.sub.1 independently of one another denote alkyl groups with at most 4 C atoms, or R and R.sub.1 conjointly denote the remaining part of a 5-membered to 6-membered carbocyclic ring.