Patents by Inventor John Silkonia

John Silkonia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Nanoporous material fabricated using a dissolvable reagent
    Patent number: 6214746
    Abstract: Nanoporous low dielectric constant materials are fabricated from a first reagent and a second reagent. The reagents are mixed to give a reagent mixture and a polymeric structure is formed from the reagent mixture. Nanosized voids are created by removing at least in part the second reagent from the polymeric structure by a method other than thermolysis, and other than evaporation.
    Type: Grant
    Filed: October 18, 1999
    Date of Patent: April 10, 2001
    Assignee: Honeywell International Inc.
    Inventors: Roger Leung, Wenya Fan, John Silkonia, Hui-Jung Wu