Abstract: An improved bubble wand assembly for a motor driven, bubble producing toy is provided. The wand assembly includes a moving substantially semi-circular, wand portion and a stationary, substantially semi-circular, wand portion, the moving and stationary wand portions being hingably connected to each other at the ends thereof to permit the moving wand portion to move in relation to the stationary wand portion from a closed and superposed position over the stationary wand portion to an open, film-forming, position at an angular orientation to the stationary wand portion.

Abstract: An improved bubble wand assembly for a motor driven, bubble producing toy is provided. The wand assembly includes a moving substantially semi-circular, wand portion and a stationary, substantially semi-circular, wand portion, the moving and stationary wand portions being hingably connected to each other at the ends thereof to permit the moving wand portion to move in relation to the stationary wand portion from a closed and superposed position over the stationary wand portion to an open, film-forming, position at an angular orientation to the stationary wand portion.

Abstract: The present invention provides an improved process for mixing castable polyurethanes and polyureas and for prolonging the dispensing time for dispensing them into a golf ball mold for application to a golf ball sub-assembly. A nozzle framework includes support housing heaters and heater adaptors for each dispensing port to delay the onset of drool and improve cut off in the dispensing tubes. The combination of fluorinated dispensing ports, the heating of the polyureas or polyurethanes, and inclusion of a capillary orifice in each dispensing port significantly prolongs the time before the advent of drool is detected.

Abstract: The present invention provides an improved process for mixing castable polyurethanes and polyureas and for prolonging the dispensing time for dispensing them into a golf ball mold for application to a golf ball sub-assembly. A nozzle framework includes support housing heaters and heater adaptors for each dispensing port to delay the onset of drool and improve cut off in the dispensing tubes. The combination of fluorinated dispensing ports, the heating of the polyureas or polyurethanes, and inclusion of a capillary orifice in each dispensing port significantly prolongs the time before the advent of drool is detected.

Abstract: The present invention provides an improved apparatus and system for mixing castable polyurethanes and polyureas and for prolonging the dispensing time for dispensing them into a golf ball mold for application to a golf ball sub-assembly. A nozzle framework includes support housing heaters and heater adaptors for each dispensing port to delay the onset of drool and improve cut off in the dispensing tubes. The combination of fluorinated dispensing ports, the heating of the polyureas or polyurethanes, and inclusion of a capillary orifice in each dispensing port significantly prolongs the time before the advent of drool is detected.

Abstract: Plasma reactor having a generally cylindrical reaction chamber which is substantially greater in diameter than in height, a generally cylindrical waveguide which is aligned axially with the reaction chamber, and a window which separates the waveguide from the reaction chamber and permits microwave energy to pass from the waveguide to chamber to ionize gas and form a plasma in the chamber. In some embodiments, the microwave energy is applied initially in pulses and thereafter as a continuous wave in order to avoid the need for retuning upon ignition of the plasma, and in others the need for retuning is avoided by the use of fins which lock in a desired mode of operation.

Abstract: Apparatus and method for generating steam free of silica-containing droplets. The apparatus makes use of the fractional distillation properties of water/quartz mixtures. At the moderately high pressures and corresponding boiling temperatures which are used in the apparatus, the steam generated from water containing quartz is considerably purer than the water from which it originated. The apparatus includes a boiler supplied with de-ionized water. The boiler has a steam generating chamber and level indicators to provide sensing of overfill and underfill levels, respectively. Steam passes out of the boiler chamber into and through a large number of small vent holes into another chamber containing quartz pieces. Droplets collect on these quartz pieces and either evaporate or gravitate and return to the boiler chamber. All parts of the apparatus of the apparatus are made of quartz except the dump valve body which is constructed from plastic material.

Abstract: Gas plasma system and process which are particularly suitable for photoresist stripping and descumming operations. A wafer is placed on a heated platen in a processing chamber and is lifted away from the platen to control thermal contact between the wafer and the platen. The front side of the wafer is also heated with radiant heat energy, and the temperature of the platen is adjusted to control the temperature of the wafer. In the disclosed embodiments, a gas plasma is generated outside the processing chamber and introduced into the chamber through a gas distribution plate which is also transparent to the radiant heat energy.

Abstract: Cleaning of low pressure chemical vapor deposition (LPCVD) furnaces is accomplished "in-situ" at furnace operating temperatures. Radio frequency (RF) power is coupled into reactive gases, that have been metered into the evacuated furnace tube, using the furnace heating coil as the coupling element so as to create an etchant gas plasma. The gas chemistry and plasma conditions are selected to remove the LPCVD film that has accumulated on the furnace quartzware surfaces during its use in the LPCVD film deposition mode. The volatile chemical byproducts of the plasma clean reaction are removed from the furnace tube by the system's vacuum pump.

Abstract: Automated reactor system and process for etching or otherwise processing semiconductor wafers in a plasma environment. The wafers are carried into and out of a reaction chamber by a conveyor and processed on an individual basis. Within the chamber, an electrode mounted on a swinging arm carries each wafer from the conveyor to a processing position adjacent to a stationary electrode. Gas is admitted to the chamber, and the electrodes are energized to ionize the gas and form a plasma for processing the wafer between the electrodes.