Patents by Inventor John Tingay
John Tingay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10393675Abstract: An x-ray inspection system including a cabinet containing an x-ray source, a sample support for supporting a sample to be inspected, and an x-ray detector; an air mover configured to force air into the cabinet through an air inlet above the sample support, where the air mover and cabinet are configured to force air through the cabinet from the air inlet past the sample support to an air outlet in the cabinet below the sample support, and an assembly for positioning the sample support relative to the x-ray source and x-ray detector. The sample support includes an upper surface extending in a horizontal plane and the sample positioning assembly includes a vertical positioning mechanism for moving the sample support in a vertical direction, orthogonal to the horizontal plane, and a first horizontal positioning mechanism for moving the sample support and vertical positioning mechanism in a first horizontal direction.Type: GrantFiled: April 3, 2015Date of Patent: August 27, 2019Assignee: Nordson CorporationInventors: John Tingay, William T. Walker, Phil King, Simon White, Kate Donaldson-Stewart
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Patent number: 10215716Abstract: An x-ray inspection system includes a cabinet including an x-ray source, a sample support supporting a sample to be inspected, and an x-ray detector. The system further includes an air mover configured to force air into the cabinet through an air inlet in the cabinet above the sample support. The air mover and cabinet are configured to force air through the cabinet from the air inlet past the sample support to an air outlet in the cabinet below the sample support. The cabinet may be constructed to provide an x-ray shield. The x-ray inspection system can be used in a clean room environment to inspect items such as semiconductor wafers.Type: GrantFiled: April 3, 2015Date of Patent: February 26, 2019Assignee: Nordson CorporationInventors: John Tingay, William T. Walker, Kate Donaldson-Stewart
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Publication number: 20170025317Abstract: An x-ray inspection system including a cabinet containing an x-ray source, a sample support for supporting a sample to be inspected, and an x-ray detector; an air mover configured to force air into the cabinet through an air inlet above the sample support, where the air mover and cabinet are configured to force air through the cabinet from the air inlet past the sample support to an air outlet in the cabinet below the sample support, and an assembly for positioning the sample support relative to the x-ray source and x-ray detector. The sample support includes an upper surface extending in a horizontal plane and the sample positioning assembly includes a vertical positioning mechanism for moving the sample support in a vertical direction, orthogonal to the horizontal plane, and a first horizontal positioning mechanism for moving the sample support and vertical positioning mechanism in a first horizontal direction.Type: ApplicationFiled: April 3, 2015Publication date: January 26, 2017Inventors: John TINGAY, William T. WALKER, Phil KING, Simon WHITE, Kate STEWART
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Publication number: 20170011973Abstract: An x-ray inspection system includes a cabinet including an x-ray source, a sample support supporting a sample to be inspected, and an x-ray detector. The system further includes an air mover configured to force air into the cabinet through an air inlet in the cabinet above the sample support. The air mover and cabinet are configured to force air through the cabinet from the air inlet past the sample support to an air outlet in the cabinet below the sample support. The cabinet may be constructed to provide an x-ray shield. The x-ray inspection system can be used in a clean room environment to inspect items such as semiconductor wafers.Type: ApplicationFiled: April 3, 2015Publication date: January 12, 2017Inventors: John Tingay, William T. Walker, Kate Stewart
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Patent number: 9442080Abstract: A method of generating a three-dimensional representation of a region of interest on a target object in an x-ray imaging system. The method uses a fiducial marker of known geometry. The region of interest and the fiducial marker are imaged in a plurality of predetermined positions. Expected images of the fiducial marker for each predetermined position are calculated and compared to captured images of the fiducial marker at each predetermined position. The difference between expected and captured imaged is used to generate corrected images of the region of interest for each predetermined position and these corrected images are used to generate a three-dimensional model of the region of interest. The method allows for the generation of useful three-dimensional models of a region of interest in an x-ray imaging system without requiring an expensive mechanical positioning system.Type: GrantFiled: August 26, 2015Date of Patent: September 13, 2016Assignee: Nordson CorporationInventors: Dragos Golubovic, John Tingay
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Publication number: 20150369757Abstract: A method of generating a three-dimensional representation of a region of interest on a target object in an x-ray imaging system. The method uses a fiducial marker of known geometry. The region of interest and the fiducial marker are imaged in a plurality of predetermined positions. Expected images of the fiducial marker for each predetermined position are calculated and compared to captured images of the fiducial marker at each predetermined position. The difference between expected and captured imaged is used to generate corrected images of the region of interest for each predetermined position and these corrected images are used to generate a three-dimensional model of the region of interest. The method allows for the generation of useful three-dimensional models of a region of interest in an x-ray imaging system without requiring an expensive mechanical positioning system.Type: ApplicationFiled: August 26, 2015Publication date: December 24, 2015Inventors: Dragos Golubovic, John Tingay
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Patent number: 9129427Abstract: A method of generating a three-dimensional representation of a region of interest on a target object in an x-ray imaging system. The method uses a fiducial marker of known geometry. The region of interest and the fiducial marker are imaged in a plurality of predetermined positions. Expected images of the fiducial marker for each predetermined position are calculated and compared to captured images of the fiducial marker at each predetermined position. The difference between expected and captured imaged is used to generate corrected images of the region of interest for each predetermined position and these corrected images are used to generate a three-dimensional model of the region of interest. The method allows for the generation of useful three-dimensional models of a region of interest in an x-ray imaging system without requiring an expensive mechanical positioning system.Type: GrantFiled: October 8, 2012Date of Patent: September 8, 2015Assignee: Nordson CorporationInventors: Dragos Golubovic, John Tingay
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Patent number: 7783377Abstract: Substrate loading and unloading apparatus for automated loading and unloading of substrates (S) in a vacuum environment, for example the work region (A) of an electron beam lithography machine, comprises a substrate holder (13) with a substrate support table (17) and locating means (18 to 21) co-operable with the table to cause a supported substrate (S) to be pressed against and thereby located on the table (17). A vacuum vessel (10) defines a loading and unloading chamber (11) with a transfer port (12) which is communicable with the evacuated region (A) of the machine and permits transfer of the holder (13) between the chamber (11) and the region (A) entirely within the vacuum environment. Release means (22, 23; 28 to 33) are present to withhold the co-operation of the table and locating means and to provide a temporary substrate support clear of the table so that substrates can be transferred to and from the table.Type: GrantFiled: August 20, 2003Date of Patent: August 24, 2010Assignee: Leica Microsystems LithographyInventors: Paul Harris, John Tingay, Martin Turnidge
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Patent number: 6885009Abstract: A device for influencing an electron beam, especially a deflector unit for an electron beam lithography machine, comprises a plurality of coil formers (12b) each with a bore (16) defining a passage for the beam and each carrying coils (18, 19) operable to generate magnetic fields for deflecting the path of the beam when passing through the passage. Each former is made of a high-strength ceramic material having a high thermal conductivity and low coefficient of thermal expansion so that, with respect to a given output of heat by the associated coils during quasi-continuous operation for repeated beam deflection during pattern writing, the heat is dissipated at such a rate as to preclude thermal expansion of the coils and thus avoid distortion of the magnetic fields generated by the coils.Type: GrantFiled: April 3, 2003Date of Patent: April 26, 2005Assignee: Leica Microsystems Lithography, Ltd.Inventors: John Tingay, Brian Raferty, Nigel Crosland
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Publication number: 20040037676Abstract: Substrate loading and unloading apparatus for automated loading and unloading of substrates (S) in a vacuum environment, for example the work region (A) of an electron beam lithography machine, comprises a substrate holder (13) with a substrate support table (17) and locating means (18 to 21) co-operable with the table to cause a supported substrate (S) to be pressed against and thereby located on the table (17). A vacuum vessel (10) defines a loading and unloading chamber (11) with a transfer port (12) which is communicable with the evacuated region (A) of the machine and permits transfer of the holder (13) between the chamber (11) and the region (A) entirely within the vacuum environment. Release means (22, 23; 28 to 33) are present to withhold the co-operation of the table and locating means and to provide a temporary substrate support clear of the table so that substrates can be transferred to and from the table.Type: ApplicationFiled: August 20, 2003Publication date: February 26, 2004Inventors: Paul Harris, John Tingay, Martin Turnidge
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Publication number: 20030230727Abstract: A device for influencing an electron beam, especially a deflector unit for an electron beam lithography machine, comprises a plurality of coil formers (12b) each with a bore (16) defining a passage for the beam and each carrying coils (18, 19) operable to generate magnetic fields for deflecting the path of the beam when passing through the passage. Each former is made of a high-strength ceramic material having a high thermal conductivity and low coefficient of thermal expansion so that, with respect to a given output of heat by the associated coils during quasi-continuous operation for repeated beam deflection during pattern writing, the heat is dissipated at such a rate as to preclude thermal expansion of the coils and thus avoid distortion of the magnetic fields generated by the coils.Type: ApplicationFiled: April 3, 2003Publication date: December 18, 2003Applicant: LEICA MICROSYSTEMS LITHOGRAPHY LTD.Inventors: John Tingay, Brian Raferty, Nigel Crosland