Patents by Inventor John Topping

John Topping has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200243309
    Abstract: Apparatus comprising: a support arranged to transport a moving substrate; a plasma generator arranged to generate plasma; and an electrode arranged to bias ions within the plasma towards the moving substrate to form an ion flux. The ion flux has an energy level between 3.6 eV and 250 eV. Alternatively, apparatus for defining plasma having a plurality of spaced race track portions.
    Type: Application
    Filed: April 2, 2020
    Publication date: July 30, 2020
    Inventors: David Anthony, John Topping
  • Publication number: 20150371834
    Abstract: Apparatus comprising: a support arranged to transport a moving substrate; a plasma generator arranged to generate plasma; and an electrode arranged to bias ions within the plasma towards the moving substrate to form an ion flux. The ion flux has an energy level between 3.6 eV and 250 eV. Alternatively, apparatus for defining plasma having a plurality of spaced race track portions.
    Type: Application
    Filed: January 24, 2014
    Publication date: December 24, 2015
    Inventors: David Anthony, John Topping
  • Publication number: 20110217477
    Abstract: A process for coating a substrate comprising condensing a radiation curable material on a substrate and curing it using an electron flux 6? with energy between 6.5 eV and 300 eV. The electron flux 6? is directed at the substrate (2) either simultaneously or sequentially with delivery of the curable material (5?). Curing is preferably initiated spatially and temporally concurrently with delivery of the material to the substrate. The electron flux is preferably generated using a low pressure gas plasma source with a driving voltage negative relative to the local voltage conditions. The low pressure gas plasma (6?) is preferably magnetically enhanced and, for example, incorporates a magnetron.
    Type: Application
    Filed: September 24, 2009
    Publication date: September 8, 2011
    Applicant: CAMVAC Limited
    Inventors: John Topping, David Anthony