Abstract: A fluid delivery system for delivering a process fluid to a vacuum processing system includes a secondary containment line surrounding a process fluid line. A purge gas flows through the secondary containment line and around the process fluid line in order to flow away any leaked process fluid. Alternatively, a heated fluid flows through the secondary containment line forming a heat trace around the process fluid line to heat the process fluid line and the process fluid by means of convection, which provides for precise uniformity of temperature throughout the length of the secondary containment line. The heated fluid loses heat to the ambient environment creating a temperature gradient through which the process fluid flows. The secondary containment line may have a heating element along its length for adding heat to the heated fluid to change the temperature gradient.

Abstract: A fluid delivery system For delivering a process fluid to a vacuum processing system includes a secondary containment line surrounding a process fluid line. A purge gas flows through the secondary containment line and around the process fluid line in order to flow away any leaked process fluid. Alternatively, a heated fluid flows through the secondary containment line forming a heat trace around the process fluid line to heat the process fluid line and the process fluid by means of convection, which provides for precise uniformity of temperature throughout the length of the secondary containment line. The heated fluid loses heat to the ambient environment creating a temperature gradient through which the process fluid flows. The secondary containment line may have a heating element along its length for adding heat to the heated fluid to change the temperature gradient.

Abstract: An improvement in the deposition of materials in a multiple chamber semiconductor processing cluster tool comprising a first cluster of first chambers, a second cluster of second chambers and a transition chamber located between the first cluster and the second cluster, where the transition chamber is adapted to deposit a material upon a wafer. Specifically, the transition chamber provides a flash coating of PVD copper on the wafer which significantly improves the adhesion of subsequently CVD deposited bulk copper without sacrifice in the throughput of the cluster tool.

Abstract: A fluid delivery system for delivering a process fluid to a vacuum processing system includes a secondary containment line surrounding a process fluid line. A purge gas flows through the secondary containment line and around the process fluid line in order to flow away any leaked process fluid. Alternatively, a heated fluid flows through the secondary containment line forming a heat trace around the process fluid line to heat the process fluid line and the process fluid by means of convection, which provides for precise uniformity of temperature throughout the length of the secondary containment line. The heated fluid loses heat to the ambient environment creating a temperature gradient through which the process fluid flows. The secondary containment line may have a heating element along its length for adding heat to the heated fluid to change the temperature gradient.

Abstract: In a method and apparatus for producing a vapor which serves as a chemical processing material by delivering a carrier gas and a reactive liquid to a vaporizer in which the vapor is produced, the operating state of the vaporizer is monitored by measuring the pressure of the carrier gas being delivered to the vaporizer and producing a detectable indication when the measured pressure exceeds a given value.

Abstract: In a process and apparatus for delivering a processing substance from a storage vessel to a processing station, the storage vessel enclosing a processing substance storage space and being coupled to conduits which communicate with the storage space, the storage vessel and the conduits enclosing a volume which includes the storage space, a method and system for determining the quantity of processing substance in the storage space by: closing the volume enclosed by the storage vessel and the conduits; performing first and second pressure measurements for measuring the gas pressure in the volume when the volume contains respectively first and second quantities of gas; determining the difference between the first and second quantities of gas; and calculating the quantity of processing substance in the storage space on the basis of the volume, the difference between the first and second quantities of gas and the gas pressures measured during the first and second pressure measurements.

Abstract: A storage device containing a quantity of a liquid chemical substance which is used as a reactant in a chemical process, the device being composed of: a closed container holding the quantity of substance and having a wall provided with an inlet opening and an outlet opening; an inlet valve coupled to said inlet opening, the inlet valve being closeable to block said inlet opening; an outlet valve coupled to the outlet opening, the outlet valve being closeable to block the outlet opening; and a filter interposed between the quantity of liquid and said outlet valve.

Abstract: A method for detecting dimethylaluminumhydride (DMAH) comprises sensing the aluminum oxide particles produced by the reaction of the DMAH with air (or with a small amount of oxygen). This is accomplished using a particle-sensing device, such as those commonly used to detect smoke, particularly an ionization-type detector.