Patents by Inventor John Viatella

John Viatella has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9527164
    Abstract: A solar cell is formed using a solar cell ablation system. The ablation system includes a single laser source and several laser scanners. The laser scanners include a master laser scanner, with the rest of the laser scanners being slaved to the master laser scanner. A laser beam from the laser source is split into several laser beams, with the laser beams being scanned onto corresponding wafers using the laser scanners in accordance with one or more patterns. The laser beams may be scanned on the wafers using the same or different power levels of the laser source.
    Type: Grant
    Filed: September 19, 2014
    Date of Patent: December 27, 2016
    Assignee: SunPower Corporation
    Inventors: Gabriel Harley, Thomas Pass, Peter John Cousins, John Viatella
  • Publication number: 20150108692
    Abstract: A solar cell is formed using a solar cell ablation system. The ablation system includes a single laser source and several laser scanners. The laser scanners include a master laser scanner, with the rest of the laser scanners being slaved to the master laser scanner. A laser beam from the laser source is split into several laser beams, with the laser beams being scanned onto corresponding wafers using the laser scanners in accordance with one or more patterns. The laser beams may be scanned on the wafers using the same or different power levels of the laser source.
    Type: Application
    Filed: September 19, 2014
    Publication date: April 23, 2015
    Inventors: Gabriel HARLEY, Thomas PASS, Peter John COUSINS, John VIATELLA
  • Patent number: 8982922
    Abstract: An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
    Type: Grant
    Filed: August 17, 2012
    Date of Patent: March 17, 2015
    Assignee: Cymer, LLC
    Inventors: Hong Ye, Alex Ershov, Rajasekhar Rao, Daniel Brown, Slava Rokitski, Rong (Lauren) Liu, Ray Cybulski, James J. Ferrell, Robert Bergstedt, John Viatella, Thomas Duffey
  • Patent number: 8859933
    Abstract: A solar cell is formed using a solar cell ablation system. The ablation system includes a single laser source and several laser scanners. The laser scanners include a master laser scanner, with the rest of the laser scanners being slaved to the master laser scanner. A laser beam from the laser source is split into several laser beams, with the laser beams being scanned onto corresponding wafers using the laser scanners in accordance with one or more patterns. The laser beams may be scanned on the wafers using the same or different power levels of the laser source.
    Type: Grant
    Filed: August 13, 2012
    Date of Patent: October 14, 2014
    Assignee: SunPower Corporation
    Inventors: Gabriel Harley, Thomas Pass, Peter John Cousins, John Viatella
  • Patent number: 8513045
    Abstract: A laser system with multiple laser pulses for removing material from a solar cell being fabricated. The laser system includes a single pulse laser source and a multi-pulse generator. The multi-pulse generator receives a single pulse laser beam from the single pulse laser source and converts the single pulse laser beam into a multi-pulse laser beam. A laser scanner scans the multi-pulse laser beam onto the solar cell to remove material from the solar cell.
    Type: Grant
    Filed: January 31, 2012
    Date of Patent: August 20, 2013
    Assignee: SunPower Corporation
    Inventors: John Viatella, Gabriel Harley, Thomas Pass
  • Publication number: 20130196464
    Abstract: A laser system with multiple laser pulses for removing material from a solar cell being fabricated. The laser system includes a single pulse laser source and a multi-pulse generator. The multi-pulse generator receives a single pulse laser beam from the single pulse laser source and converts the single pulse laser beam into a multi-pulse laser beam. A laser scanner scans the multi-pulse laser beam onto the solar cell to remove material from the solar cell.
    Type: Application
    Filed: January 31, 2012
    Publication date: August 1, 2013
    Inventors: JOHN VIATELLA, GABRIEL HARLEY, THOMAS PASS
  • Publication number: 20120312791
    Abstract: A solar cell is formed using a solar cell ablation system. The ablation system includes a single laser source and several laser scanners. The laser scanners include a master laser scanner, with the rest of the laser scanners being slaved to the master laser scanner. A laser beam from the laser source is split into several laser beams, with the laser beams being scanned onto corresponding wafers using the laser scanners in accordance with one or more patterns. The laser beams may be scanned on the wafers using the same or different power levels of the laser source.
    Type: Application
    Filed: August 13, 2012
    Publication date: December 13, 2012
    Inventors: Gabriel HARLEY, Thomas PASS, Peter John COUSINS, John VIATELLA
  • Publication number: 20120307858
    Abstract: An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
    Type: Application
    Filed: August 17, 2012
    Publication date: December 6, 2012
    Inventors: Hong Ye, Alex Ershov, Rajasekhar Rao, Daniel Brown, Slava Rokitski, Rong (Lauren) Liu, Ray Cybulski, James J. Ferrell, Robert Bergstedt, John Viatella, Thomas Duffey
  • Patent number: 8284815
    Abstract: An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
    Type: Grant
    Filed: October 9, 2009
    Date of Patent: October 9, 2012
    Assignee: Cymer, Inc.
    Inventors: Hong Ye, Alex Ershov, Rajasekhar Rao, Daniel Brown, Slava Rokitski, Rong (Lauren) Liu, Ray Cybulski, James J. Ferrell, Robert Bergstedt, John Viatella, Thomas Duffey
  • Patent number: 8263899
    Abstract: A solar cell is formed using a solar cell ablation system. The ablation system includes a single laser source and several laser scanners. The laser scanners include a master laser scanner, with the rest of the laser scanners being slaved to the master laser scanner. A laser beam from the laser source is split into several laser beams, with the laser beams being scanned onto corresponding wafers using the laser scanners in accordance with one or more patterns. The laser beams may be scanned on the wafers using the same or different power levels of the laser source.
    Type: Grant
    Filed: July 1, 2010
    Date of Patent: September 11, 2012
    Assignee: SunPower Corporation
    Inventors: Gabriel Harley, Thomas Pass, Peter John Cousins, John Viatella
  • Publication number: 20120003788
    Abstract: A solar cell is formed using a solar cell ablation system. The ablation system includes a single laser source and several laser scanners. The laser scanners include a master laser scanner, with the rest of the laser scanners being slaved to the master laser scanner. A laser beam from the laser source is split into several laser beams, with the laser beams being scanned onto corresponding wafers using the laser scanners in accordance with one or more patterns. The laser beams may be scanned on the wafers using the same or different power levels of the laser source.
    Type: Application
    Filed: July 1, 2010
    Publication date: January 5, 2012
    Inventors: Gabriel Harley, Thomas Pass, Peter John Cousins, John Viatella
  • Publication number: 20100098120
    Abstract: An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed.
    Type: Application
    Filed: October 9, 2009
    Publication date: April 22, 2010
    Inventors: Hong Ye, Alex Ershov, Rajasekhar Rao, Daniel Brown, Slava Rokitski, Rong (Lauren) Liu, Ray Cybulski, James J. Ferrell, Robert Bergstedt, John Viatella, Thomas Duffey
  • Patent number: 7323703
    Abstract: An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.
    Type: Grant
    Filed: December 27, 2006
    Date of Patent: January 29, 2008
    Assignee: Cymer, Inc.
    Inventors: I. Roger Oliver, William N. Partlo, Igor V. Fomenkov, Alexander I. Ershov, Norbert Bowering, John Viatella, David W. Myers
  • Publication number: 20070158596
    Abstract: An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.
    Type: Application
    Filed: December 27, 2006
    Publication date: July 12, 2007
    Inventors: I. Oliver, William Partlo, Igor Fomenkov, Alexander Ershov, Norbert Bowering, John Viatella, Dave Myers
  • Patent number: 7164144
    Abstract: A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, and a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.
    Type: Grant
    Filed: July 27, 2004
    Date of Patent: January 16, 2007
    Assignee: Cymer Inc.
    Inventors: William N. Partlo, Norbert Bowering, Alexander I. Ershov, Igor V. Fomenkov, David W. Myers, Ian Roger Oliver, John Viatella, Robert N. Jacques
  • Publication number: 20060289806
    Abstract: A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages.
    Type: Application
    Filed: June 28, 2005
    Publication date: December 28, 2006
    Applicant: Cymer, Inc.
    Inventors: Rodney Simmons, John Viatella, Jerzy Hoffman, R. Webb, Alexander Bykanov, Oleh Khodykin
  • Publication number: 20050199829
    Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.
    Type: Application
    Filed: July 27, 2004
    Publication date: September 15, 2005
    Inventors: William Partlo, Norbert Bowering, Alexander Ershov, Igor Fomenkov, David Myers, Ian Oliver, John Viatella, Robert Jacques