Patents by Inventor John Vincent Schmitt

John Vincent Schmitt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and apparatus for improved vaporization of deposition material in a substrate processing system
    Patent number: 6596085
    Abstract: A deposition system for performing chemical vapor deposition comprising deposition chamber and a vaporizer coupled to said chamber. In one aspect, the vaporizer has a relatively short mixing passageway to mix a carrier gas with a liquid precursor to produce a fine aerosol-like dispersion of liquid precursor which is vaporized by a hot plate.
    Type: Grant
    Filed: February 1, 2000
    Date of Patent: July 22, 2003
    Assignee: Applied Materials, Inc.
    Inventors: John Vincent Schmitt, Shih-Hung Li, Christophe Marcadal, Anzhong Chang, Ling Chen
  • Method for unreacted precursor conversion and effluent removal
    Patent number: 6402806
    Abstract: A hot trap converts unreacted organic metal-film precursor from the exhaust stream of a CVD process. The converted precursor forms a metal film on the surface of the hot trap, thereby protecting hot vacuum pump surfaces from metal build up. A cold trap downstream from the hot trap freezes effluents from the exhaust stream. The metal captured by the hot trap and the effluents captured by the cold trap may then be recycled, rather than being released as environmental emissions.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: June 11, 2002
    Assignee: Applied Materials, Inc.
    Inventors: John Vincent Schmitt, Ling Chen, George Michael Bleyle, Yu Cong, Alfred Mak, Mei Chang
  • Chemical vapor deposition hot-trap for unreacted precursor conversion and effluent removal
    Patent number: 6099649
    Abstract: A hot trap converts unreacted organic metal-film precursor from the exhaust stream of a CVD process. The converted precursor forms a metal film on the surface of the hot trap, thereby protecting hot vacuum pump surfaces from metal build up. A cold trap downstream from the hot trap freezes effluents from the exhaust stream. The metal captured by the hot trap and the effluents captured by the cold trap may then be recycled, rather than being released as environmental emissions.
    Type: Grant
    Filed: December 23, 1997
    Date of Patent: August 8, 2000
    Assignee: Applied Materials, Inc.
    Inventors: John Vincent Schmitt, Ling Chen, George Michael Bleyle, Yu Cong, Alfred Mak, Mei Chang
  • Method and apparatus for monitoring generation of liquid chemical vapor
    Patent number: 5972117
    Abstract: In a method and apparatus for producing a vapor containing a liquid chemical by bubbling a carrier gas through a mass of the liquid chemical, vapor production is monitored by: determining successive values of the pressure of the carrier gas being delivered to the mass of liquid chemical, over a time period; and calculating, on the basis of the successive values of the pressure, the frequency of bubble formation during the bubbling of the carrier gas.
    Type: Grant
    Filed: September 3, 1997
    Date of Patent: October 26, 1999
    Assignee: Applied Materials, Inc.
    Inventor: John Vincent Schmitt