Patents by Inventor John W. Clavier

John W. Clavier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Inorganic resins for clinical use of Bi generators
    Patent number: 7914766
    Abstract: Applicant's invention is a radionuclide generator resin material for radiochemical separation of daughter radionuclides, particularly 213Bi, from a solution of parental radionuclides, the resin material capable of providing clinical quantities of 213Bi of at least 20-mCi, wherein the resin material comprises a silica-based structure having at least one bifunctional ligand covalently attached to the surface of the silica-based structure. The bifunctional ligand comprises a chemical group having desirable surface functionality to enable the covalent attachment of the bifunctional ligand thereon the surface of the structure and the bifunctional ligand further comprises a second chemical group capable of binding and holding the parental radionuclides on the resin material while allowing the daughter radionuclides to elute off the resin material. The bifunctional ligand has a carbon chain with a limited number of carbons to maintain radiation stability of the resin material.
    Type: Grant
    Filed: June 3, 2004
    Date of Patent: March 29, 2011
    Assignee: UT-Battelle LLC
    Inventors: David W. DePaoli, Michael Z. Hu, Saed Mirzadeh, John W. Clavier
  • INORGANIC RESINS FOR CLINICAL USE OF 213BI GENERATORS
    Publication number: 20110065816
    Abstract: Applicant's invention is a radionuclide generator resin material for radiochemical separation of daughter radionuclides, particularly 213Bi, from a solution of parental radionuclides, the resin material capable of providing clinical quantities of 213Bi of at least 20-mCi, wherein the resin material comprises a silica-based structure having at least one bifunctional ligand covalently attached to the surface of the silica-based structure. The bifunctional ligand comprises a chemical group having desirable surface functionality to enable the covalent attachment of the bifunctional ligand thereon the surface of the structure and the bifunctional ligand further comprises a second chemical group capable of binding and holding the parental radionuclides on the resin material while allowing the daughter radionuclides to elute off the resin material. The bifunctional ligand has a carbon chain with a limited number of carbons to maintain radiation stability of the resin material.
    Type: Application
    Filed: June 3, 2004
    Publication date: March 17, 2011
    Inventors: David W. DePaoli, Michael Z. Hu, Saed Mirzadeh, John W. Clavier