Patents by Inventor John W. Griswold

John W. Griswold has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Chamber conditioning for remote plasma process
    Patent number: 10211099
    Abstract: The methods, systems and apparatus described herein relate to chamber conditioning for remote plasma processes, in particular remote nitrogen-based plasma processes. Certain implementations of the disclosure relate to remote plasma inhibition processes for feature fill that include chamber conditioning. Embodiments of the disclosure relate to exposing remote plasma processing chambers to fluorine species prior to nitrogen-based remote plasma processing of substrates such as semiconductor wafers. Within-wafer uniformity and wafer-to-wafer uniformity is improved.
    Type: Grant
    Filed: December 19, 2016
    Date of Patent: February 19, 2019
    Assignee: Lam Research Corporation
    Inventors: Deqi Wang, Gang Liu, Anand Chandrashekar, Tsung-Han Yang, John W. Griswold
  • CHAMBER CONDITIONING FOR REMOTE PLASMA PROCESS
    Publication number: 20180174901
    Abstract: The methods, systems and apparatus described herein relate to chamber conditioning for remote plasma processes, in particular remote nitrogen-based plasma processes. Certain implementations of the disclosure relate to remote plasma inhibition processes for feature fill that include chamber conditioning. Embodiments of the disclosure relate to exposing remote plasma processing chambers to fluorine species prior to nitrogen-based remote plasma processing of substrates such as semiconductor wafers. Within-wafer uniformity and wafer-to-wafer uniformity is improved.
    Type: Application
    Filed: December 19, 2016
    Publication date: June 21, 2018
    Inventors: Deqi Wang, Gang Liu, Anand Chandrashekar, Tsung-Han Yang, John W. Griswold