Patents by Inventor John W. Viatella

John W. Viatella has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7402825
    Abstract: A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser entrance enclosure intermediate the entrance window and a plasma initiation site within the chamber and comprising an entrance enclosure distal end opening; at least one aperture plate intermediate the distal opening and the entrance window comprising at least one drive laser passage aperture. The at least one aperture plate may comprise at least two aperture plates comprising a first aperture plate and a second aperture plate defining an aperture plate interim space. The at least one drive laser aperture passage may comprise at least two drive laser aperture passages.
    Type: Grant
    Filed: June 28, 2005
    Date of Patent: July 22, 2008
    Assignee: Cymer, Inc.
    Inventors: Rodney D. Simmons, John W. Viatella, Jerzy R. Hoffman, R. Kyle Webb, Alexander N. Bykanov, Oleh Khodykin