Abstract: Certain aspects of the present disclosure provide a method, including: processing input data with a feature extraction stage of a machine learning model to generate a feature map; applying an attention map to the feature map to generate an augmented feature map; processing the augmented feature map with a refinement stage of the machine learning model to generate a refined feature map; processing the refined feature map with a first regression stage of the machine learning model to generate multi-dimensional task output data; and processing the refined feature data with an attention stage of the machine learning model to generate an updated attention map.

Abstract: Certain aspects of the present disclosure provide a method, including: processing input data with a feature extraction stage of a machine learning model to generate a feature map; applying an attention map to the feature map to generate an augmented feature map; processing the augmented feature map with a refinement stage of the machine learning model to generate a refined feature map; processing the refined feature map with a first regression stage of the machine learning model to generate multi-dimensional task output data; and processing the refined feature data with an attention stage of the machine learning model to generate an updated attention map.

Abstract: Composite membranes include a polymer material that is selectively permeable to heavy (C3+) hydrocarbons over methane. The polymer material may be a modified poly(dimethylsilane) having a backbone including dimethylsiloxyl monomers, substituted methylsiloxyl monomers, and internal-network monomers. The substituted methylsiloxyl monomers may include phenylmethylsiloxyl monomers or C5-C10 alkylmethylsiloxyl monomers such as octylmethylsiloxyl monomers. The polymer material may include silicon-alkyl linkages such as Si—(CH2)n—Si, where n?2 that may create a structure that imparts desirable permeability and selectivity characteristics to the composite membrane. The polymer material may be cast onto a porous support material. The composite membranes may be incorporated into systems or methods for removing heavy hydrocarbons from natural gas.

Abstract: A stock for a firearm is disclosed. The stock has a locking mechanism. The locking mechanism prevents the movement of the stock relative to a receiver extension. A locking member protrudes into a corresponding recess in the receiver extension, creating a detent arrangement. The locking member, a locating member, a crossbar, and a pin interact with one another and the stock to prevent disengagement of the detent arrangement.

Abstract: Composite membranes include a polymer material that is selectively permeable to heavy (C3+) hydrocarbons over methane. The polymer material may be a modified poly(dimethylsilane) having a backbone including dimethylsiloxyl monomers, substituted methylsiloxyl monomers, and internal-network monomers. The substituted methylsiloxyl monomers may include phenylmethylsiloxyl monomers or C5-C10 alkylmethylsiloxyl monomers such as octylmethylsiloxyl monomers. The polymer material may include silicon-alkyl linkages such as Si—(CH2)n—Si, where n?2 that may create a structure that imparts desirable permeability and selectivity characteristics to the composite membrane. The polymer material may be cast onto a porous support material. The composite membranes may be incorporated into systems or methods for removing heavy hydrocarbons from natural gas.

Abstract: An integrated Light Emitting Diode (LED) device including multiple LEDs connected to a circuit board, integrated circuit (IC) drivers connected to the circuit board, and a first alternating current (AC) terminal and a second AC terminal connected to the circuit board.

Abstract: Unique digital signatures of sensitive or restricted image files are calculated and stored in a database. A hook routine hooks an open or read command when an application opens an image file in order to check for a restricted digital signature of that image file. If present, a digital watermark is added to the image before the application edits that image. A user may then modify the image. A hook routine also hooks a close or write command in order to check for a digital watermark. If present, the digital watermark is removed and a new digital signature for the revised image is calculated. The digital signature for the revised image is then uploaded to a database associated with a DLP server software product, and then pushed periodically down to endpoint DLP client products.

Abstract: Cleats configured to retain objects secured with a packaging tie in association with packaging material.

Abstract: An integrated Light Emitting Diode (LED) device including multiple LEDs connected to a circuit board, integrated circuit (IC) drivers connected to the circuit board, and a first alternating current (AC) terminal and a second AC terminal connected to the circuit board.

Abstract: A utility lighter includes a handle casing, a gas releasing valve, a bendable extension arm, a torch nozzle, a piezoelectric unit and an actuation device. The bendable extension arm has an upper end and a lower end extended from the handle casing, wherein the extension arm has a deformable receiving channel which is extended from the lower end to the upper end and is adapted to be curved when the extension arm is selectively bent between the upper end and the lower end. The torch nozzle is provided at the upper end of the extension arm to communicate with the gas releasing valve through the receiving channel for releasing the gas through the torch nozzle when the actuation device is actuated to depress the piezoelectric unit. The result is that a torch flame is generated at the torch nozzle at a distance from the handle casing.

Abstract: Cleats configured to retain objects secured with a packaging tie in association with packaging material.

Abstract: A utility lighter includes a handle casing, a gas releasing valve, a bendable extension arm, a torch nozzle, a piezoelectric unit and an actuation device. The bendable extension arm has an upper end and a lower end extended from the handle casing, wherein the extension arm has a deformable receiving channel which is extended from the lower end to the upper end and is adapted to be curved when the extension arm is selectively bent between the upper end and the lower end. The torch nozzle is provided at the upper end of the extension arm to communicate with the gas releasing valve through the receiving channel for releasing the gas through the torch nozzle when the actuation device is actuated to depress the piezoelectric unit. The result is that a torch flame is generated at the torch nozzle at a distance from the handle casing.

Abstract: A solution of ammonium citrate and benzotriazole (BTA) is used to clean thin film magnetic head wafers. When used with brushing, the solution is a highly efficient process for removing particles, such as those generated during chemical-mechanical polishing (CMP), without causing corrosion and roughness. This process may be used on all CMP layers in thin film magnetic head wafer fabrication.

Abstract: A method for work hardening gold contact pads is disclosed. The method includes providing gold contact pads, providing lapping pads, and placing the lapping pads in contact with the gold contact pads to create a contact interface. A liquid medium is then applied to the contact interface while moving the lapping pads relative to the gold contact pads. The liquid medium is preferably a particulate-free pH neutral liquid, which makes water a good choice. Also disclosed is a gold pad having a work hardened surface.

Abstract: A method for chemical mechanical polishing (CMP) wafers having high aspect ratio surface topography. A wafer is positioned on a plate. A polishing pad is coupled to a platen. A polishing solution (e.g., slurry) is added between the polishing pad and the wafer. CMP is performed on the wafer by creating a relative movement between the polishing pad and the wafer. The polishing pad removes substantially all residual material from the channels. To accomplish this, the polishing pad has a compressibility of at least 5% at a polishing pressure of about 4 psi.

Abstract: A method for forming metrology structures for a CMP process is described. A trench edge is formed in a base material or stack of materials which are preferably deposited as part of the process of fabricating the production structures on the wafer. A covering film of a second material with preferably with contrasting SEM properties is deposited over the trench edge in the base material. During CMP the covering film is preferentially worn away at the edge revealing the base material. The width of the base material which has been revealed is a measure of the progress of the CMP. Since the base material and the covering material are preferably selected to have contrasting images in an SEM, a CD-SEM can be used to precisely measure the CMP progress.

Abstract: A magnetic write head for use in a data recording system having first and second magnetic pole, the first pole having a P1 pedestal. An electrically conductive coil passes through a space between the first and second poles for inducing a magnetic flux through the yoke formed by the first and second poles. A bi-layer insulation layer disposed between the poles includes a layer of photoresist for preventing voids and a layer of alumina formed thereover to provide a structural brace to prevent recession of the P1 pedestal during manufacturing operations such as soda blast.

Abstract: A childproof safety disposable lighter includes a casing, a supporting frame detachably mounted on the casing, an ignition unit which is supported by the supporting frame and includes a striker wheel mounted between two driving wheels, and a pair of safety shells, which are coaxially positioned with the striker wheel and facing two outer sides of the two driving wheels respectively, being integrally, upwardly, and rearwardly extended from two supporting walls of the supporting frame respectively, wherein each of the safety shells is in circular shape having an outer smooth surface and a radius slightly larger than that of the driving wheels so that the two safety shells encircle the outer sides of the two driving wheels respectively to form two physical barriers of the driving wheels.

Abstract: A Chemical Mechanical Polish (CMP) process and slurry therefore slurry that is capable of removing NiFe, SiO2, Photoresist, Ta, alumina and Cu at substantially the same rate. The slurry is useful for obtaining a substantially planar surface of several materials while avoiding corrosion of Cu coil and NiFe structure.

Abstract: A method of manufacture of magnetic heads which include CoFe elements using CMP is presented. The method includes providing a slurry of Al2O3, adjusting the concentration of H2O2 in said slurry to within a range of 6-12% by volume and balancing mechanical polishing action. The balancing is done by adjusting the table speed of a mechanical polisher to within a range of 55-90 rpm, and adjusting polishing pressure to within a range of 5-7 psi. Also a magnetic head having elements made of CoFe material made by this method is disclosed.