Patents by Inventor John Z. Ye

John Z. Ye has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for ion beam containment in an ion beam guide
    Patent number: 6759665
    Abstract: An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet mounted in a passageway along the path of an ion beam, and a magnetic device adapted to provide a multi-cusped magnetic field in the passageway, which may include a plurality of magnets mounted along at least a portion of the passageway. The magnets may cooperatively interact to provide a multi-cusped magnetic field along at least a portion of the passageway. The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway for a given low energy ion beam. The invention thus provides enhancement of beam plasma within a mass analyzer dipole magnetic field for low energy ion beams without the introduction of externally generated plasma.
    Type: Grant
    Filed: May 24, 2001
    Date of Patent: July 6, 2004
    Assignee: Axcelis Technologies, Inc.
    Inventors: Victor M. Benveniste, William F. DiVergilio, John Z. Ye
  • System and method for removing particles entrained in an ion beam
    Patent number: 6525326
    Abstract: A system for inhibiting the transport of contaminant particles with an ion beam includes an electric field generator for generating an electric field relative to a path of travel for the ion beam. A particle located in the ion beam and in a region of the electric field is charged to a polarity according to the ion beam, so that the electric field may urge the charged particle out of the ion beam.
    Type: Grant
    Filed: September 1, 2000
    Date of Patent: February 25, 2003
    Assignee: Axcelis Technologies, Inc.
    Inventors: Eric R. Harrington, Victor M. Benveniste, Jeffrey A. Burgess, John Z. Ye
  • Method and system for ion beam containment in an ion beam guide
    Publication number: 20020014587
    Abstract: An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet mounted in a passageway along the path of an ion beam, and a magnetic device adapted to provide a multi-cusped magnetic field in the passageway, which may include a plurality of magnets mounted along at least a portion of the passageway. The magnets may cooperatively interact to provide a multi-cusped magnetic field along at least a portion of the passageway. The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway for a given low energy ion beam. The invention thus provides enhancement of beam plasma within a mass analyzer dipole magnetic field for low energy ion beams without the introduction of externally generated plasma.
    Type: Application
    Filed: May 24, 2001
    Publication date: February 7, 2002
    Inventors: Victor M. Benveniste, William F. DiVergilio, John Z. Ye.